发明授权
US4968712A Fungicidal 1,4-disubstituted 1-azolyl-3,3-dimethylbutane derivatives
失效
杀真菌剂1,4-二取代的1-噻唑基-3,3-二甲基丁烷衍生物
- 专利标题: Fungicidal 1,4-disubstituted 1-azolyl-3,3-dimethylbutane derivatives
- 专利标题(中): 杀真菌剂1,4-二取代的1-噻唑基-3,3-二甲基丁烷衍生物
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申请号: US225971申请日: 1988-07-29
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公开(公告)号: US4968712A公开(公告)日: 1990-11-06
- 发明人: Hans-Ludwig Elbe , Albrecht Marhold , Karl H. Buchel , Stefan Dutzmann , Paul Reinecke , Wilhelm Brandes , Gerhard Hanssler
- 申请人: Hans-Ludwig Elbe , Albrecht Marhold , Karl H. Buchel , Stefan Dutzmann , Paul Reinecke , Wilhelm Brandes , Gerhard Hanssler
- 申请人地址: DEX Leverkusen
- 专利权人: Bayer Aktiengesellschaft
- 当前专利权人: Bayer Aktiengesellschaft
- 当前专利权人地址: DEX Leverkusen
- 优先权: DEX3725397 19870731
- 主分类号: A01N43/653
- IPC分类号: A01N43/653 ; A01N47/02 ; C07D233/60 ; C07D249/08 ; C07D405/10 ; C07D521/00
摘要:
Fungicidal 1,4-disubstituted 1-azolyl-3,3-dimethylbutane derivatives of the formula ##STR1## in which R.sup.1 represents hydrogen or halogen,R.sup.2 represents hydrogen or halogen,R.sup.3 represents hydrogen, halogen or trifluoromethoxy,R.sup.4 represents halogen, trifluoromethoxy, trifluoromethylthio, trifluoromethylsulphinyl, trifluoromethylsulphonyl, difluoromethoxy, difluorochloromethoxy, trifluorochloroethoxy, tetrafluoroethoxy, trifluoroethoxy, difluoromethylthio, trifluorochloroethylthio, tetrafuoroethylthio, difluoromethylsulphinyl, difluorochloromethylsulphinyl, trifluorochloroethylsulphinyl, tetrafluoroethylsulphinyl, difluoromethylsulphonyl, difluorochloromethylsulphonyl, trifluorochloroethylsulphonyl, tetrafluoroethylsulphonyl, difluorobromomethylthio, difluorobromomethylsulphinyl, difluorobromomethylsulphonyl or difluorochloromethylthio orR.sup.3 and R.sup.4 together represent alkylenedioxy substituted by halogen,R.sup.5 represents hydrogen or halogen,A represents a keto group or a CH(OH) grouping,Z represents a nitrogen atom or the CH group andR.sup.6 and R.sup.7 identical or different and independently of one another represent hydrogen, alkyl, alkenyl, alkynyl, optionally substituted cycloalkyl, optionally substituted cycloalkylalkyl or optionally substituted phenylalkyl, whereR.sup.3 represents trifluoromethoxy whenR.sup.4 represents halogen,and addition products thereof with acids and metal salts.
公开/授权文献
- US6033481A Plasma processing apparatus 公开/授权日:2000-03-07
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