发明授权
- 专利标题: Method of making a trench dram cell
- 专利标题(中): 制造沟槽电池的方法
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申请号: US412742申请日: 1989-09-26
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公开(公告)号: US4980310A公开(公告)日: 1990-12-25
- 发明人: Yoshio Matsuda , Kazuyasu Fujishima
- 申请人: Yoshio Matsuda , Kazuyasu Fujishima
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX61-250162 19861020
- 主分类号: H01L27/10
- IPC分类号: H01L27/10 ; H01L21/8242 ; H01L27/108
摘要:
A dynamic semiconductor memory device comprising a substrate having one trench including two capacitors for memory cell capacitances of two bits, and two elements such as transistors for reading, writing, and storing information represented by charge, arranged symmetrically at the central portion of the trench so as to correspond to the memory cells for two bits, and a field oxide film formed at the center of the trench on the bottom and on the side walls for separating the capacitors and elements.
公开/授权文献
- US5738025A Method and apparatus for thermal cracking of waste plastics 公开/授权日:1998-04-14
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