发明授权
- 专利标题: Selective electrolytic desposition on conductive and non-conductive substrates
- 专利标题(中): 导电和非导电基底上的选择性电解沉积
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申请号: US289944申请日: 1988-12-27
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公开(公告)号: US4988412A公开(公告)日: 1991-01-29
- 发明人: Yung S. Liu , Herbert S. Cole , Renato Guida , James W. Rose
- 申请人: Yung S. Liu , Herbert S. Cole , Renato Guida , James W. Rose
- 申请人地址: NY Schenectady
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: NY Schenectady
- 主分类号: C25D5/02
- IPC分类号: C25D5/02 ; H01L21/288 ; H01L23/538 ; H05K3/24
摘要:
Selective electrolytic deposition is provided on a body having a conductive surface comprised of two different conductive materials in which one of the conductive materials forms a surface layer upon exposure to a particular ambient environment and wherein that surface layer prevents electroplating on that material in the particular electroplating environment utilized for the electroplating of the desired pattern on the other conductive material.
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