发明授权
- 专利标题: Semiconductor device
- 专利标题(中): 半导体器件
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申请号: US298764申请日: 1989-01-17
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公开(公告)号: US5001536A公开(公告)日: 1991-03-19
- 发明人: Tadashi Fukuzawa , Michiharu Nakamura , Eizaburo Yamada
- 申请人: Tadashi Fukuzawa , Michiharu Nakamura , Eizaburo Yamada
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX56-92304 19810617; JPX57-11663 19820129
- 主分类号: H01L27/06
- IPC分类号: H01L27/06 ; H01L29/267 ; H01L29/51 ; H01L29/778
摘要:
In a semiconductor device having, at least, a first semiconductor layer which contains substantially no impurity, a second semiconductor layer which has a band gap greater than that of the first semiconductor layer and which contains an impurity, an interface between the first and second semiconductor layers forming a heterojunction, at least one pair of electrodes which are electronically connected with the first semiconductor layer, and means to control carriers developing at the heterojunction interface; a semiconductor device characterized in that the first semiconductor layer is a Ge layer, while the second semiconductor layer is a group III-V compound semiconductor layer.
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