发明授权

  • 专利标题: Method for topically-resolved determination of the diffusion length of minority charge carriers in a semiconductor crystal body with the assistance of an electrolytic cell
  • 专利标题(中): 借助于电解槽来局部地确定半导体晶体中的少数载流子的扩散长度的方法
  • 申请号: US522115
    申请日: 1990-05-11
  • 公开(公告)号: US5010294A
    公开(公告)日: 1991-04-23
  • 发明人: Helmut FoellVolker Lehmann
  • 申请人: Helmut FoellVolker Lehmann
  • 申请人地址: DEX Munich
  • 专利权人: Siemens Aktiengesellschaft
  • 当前专利权人: Siemens Aktiengesellschaft
  • 当前专利权人地址: DEX Munich
  • 优先权: DEX3917702 19890531
  • 主分类号: G01N21/00
  • IPC分类号: G01N21/00 G01R31/265 H01L21/66
Method for topically-resolved determination of the diffusion length of
minority charge carriers in a semiconductor crystal body with the
assistance of an electrolytic cell
摘要:
The measurement of the diffusion length of minority charge carriers in a semiconductor crystal body is enabled in that the front side and the rear side of the crystal wafer are each respectively brought into contact with an electrolyte in a respective measuring cell and an inhibiting space charge zone is generated at the front side of the wafer. The front side is irradiated with light having a wave length of .lambda.>800 nm and the front side photocurrent I.sub.1 of the minority charge carriers thereby generated is measured. The diffusion length L can be calculated from the photocurrent I.sub.1 with the assistance of a mathematical equation. The topical distribution of the diffusion length L is obtained given point-by-point irradiation and scanning over the crystal wafer. Diffusion lengths of L 800 nm.
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