Invention Grant
- Patent Title: Method for topically-resolved determination of the diffusion length of minority charge carriers in a semiconductor crystal body with the assistance of an electrolytic cell
- Patent Title (中): 借助于电解槽来局部地确定半导体晶体中的少数载流子的扩散长度的方法
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Application No.: US522115Application Date: 1990-05-11
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Publication No.: US5010294APublication Date: 1991-04-23
- Inventor: Helmut Foell , Volker Lehmann
- Applicant: Helmut Foell , Volker Lehmann
- Applicant Address: DEX Munich
- Assignee: Siemens Aktiengesellschaft
- Current Assignee: Siemens Aktiengesellschaft
- Current Assignee Address: DEX Munich
- Priority: DEX3917702 19890531
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01R31/265 ; H01L21/66
Abstract:
The measurement of the diffusion length of minority charge carriers in a semiconductor crystal body is enabled in that the front side and the rear side of the crystal wafer are each respectively brought into contact with an electrolyte in a respective measuring cell and an inhibiting space charge zone is generated at the front side of the wafer. The front side is irradiated with light having a wave length of .lambda.>800 nm and the front side photocurrent I.sub.1 of the minority charge carriers thereby generated is measured. The diffusion length L can be calculated from the photocurrent I.sub.1 with the assistance of a mathematical equation. The topical distribution of the diffusion length L is obtained given point-by-point irradiation and scanning over the crystal wafer. Diffusion lengths of L 800 nm.
Public/Granted literature
- US4947419A Container for photosensitive material Public/Granted day:1990-08-07
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