发明授权
- 专利标题： Deposition heaters
- 专利标题（中）： 沉积加热器
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申请号： US406785申请日： 1989-09-13
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公开(公告)号： US5031229A公开(公告)日： 1991-07-09
- 发明人: Loren A. Chow
- 申请人： Loren A. Chow
- 专利权人： Chow Loren A
- 当前专利权人： Chow Loren A
- 主分类号： C23C14/24
- IPC分类号： C23C14/24 ; F27B14/00 ; F27B14/10 ; F27B14/12 ; F27B14/14 ; F27D99/00
摘要：
A gaseous deposition source for providing a deposition material that emanates from a crucible having mulitple thin film heating elements formed thereon, with each adjacent pair being separated by an insulating layer therebetween. A gaseous deposition source can have a crucible with a cover thereon with one or more apertures therein and with thin film heating elements on that cover about such apertures. A substrate heater may be used formed of thin film heating elements provided on a base.
公开/授权文献
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