发明授权
US5068884A X-ray generation system for an ultra fine lithography and a method
therefor
失效
用于超细光刻的X射线产生系统及其方法
- 专利标题: X-ray generation system for an ultra fine lithography and a method therefor
- 专利标题(中): 用于超细光刻的X射线产生系统及其方法
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申请号: US459244申请日: 1989-12-29
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公开(公告)号: US5068884A公开(公告)日: 1991-11-26
- 发明人: Young K. Choe , Jeon W. Yang , Jin H. Lee , Jae S. Lee , Kyu H. Shim , Jin Y. Kang
- 申请人: Young K. Choe , Jeon W. Yang , Jin H. Lee , Jae S. Lee , Kyu H. Shim , Jin Y. Kang
- 申请人地址: KRX Chungnam
- 专利权人: Electronics and Telecommunications Research Institute
- 当前专利权人: Electronics and Telecommunications Research Institute
- 当前专利权人地址: KRX Chungnam
- 优先权: KRX88-17987 19881230
- 主分类号: H01J35/22
- IPC分类号: H01J35/22 ; G03F7/20 ; H01L21/00 ; H05G2/00
摘要:
An X-ray generation system for an ultra fine lithography includes a center electrode having an adjusting member, peripheral electrode having gas flow holes, a metal disc having gas flow holes for generating the X-ray from a plasma, a large capacitor, a transparent cylinder, a discharge member, Be discharge and observing windows, a cylindrical insulator, exhaust holes, a metal container, large electric power spatial gap switches, a current returning wire, an exhaust pump, and gas feeding members. Thereby, the system provides continuous operation and increased stability, controlling and discharging quantity so that the X-ray system can be easily utilized for researching and commercial applications.
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