公开(公告)号：US5068884A

公开(公告)日：1991-11-26

申请号：US459244

申请日：1989-12-29

申请人： Young K. Choe ,  Jeon W. Yang ,  Jin H. Lee ,  Jae S. Lee ,  Kyu H. Shim ,  Jin Y. Kang

发明人： Young K. Choe ,  Jeon W. Yang ,  Jin H. Lee ,  Jae S. Lee ,  Kyu H. Shim ,  Jin Y. Kang

IPC分类号： H01J35/22 ,  G03F7/20 ,  H01L21/00 ,  H05G2/00

CPC分类号： H05G2/003 ,  G03F7/70033

摘要： An X-ray generation system for an ultra fine lithography includes a center electrode having an adjusting member, peripheral electrode having gas flow holes, a metal disc having gas flow holes for generating the X-ray from a plasma, a large capacitor, a transparent cylinder, a discharge member, Be discharge and observing windows, a cylindrical insulator, exhaust holes, a metal container, large electric power spatial gap switches, a current returning wire, an exhaust pump, and gas feeding members. Thereby, the system provides continuous operation and increased stability, controlling and discharging quantity so that the X-ray system can be easily utilized for researching and commercial applications.

摘要翻译： 用于超细光刻的X射线产生系统包括具有调节构件的中心电极，具有气体流通孔的外围电极，具有用于从等离子体产生X射线的气体流通孔的金属盘，大电容器，透明 圆筒，放电构件，放电观察窗，圆柱形绝缘体，排气孔，金属容器，大电力空间间隙开关，回流电线，排气泵和气体供给构件。 因此，该系统提供连续操作和增加的稳定性，控制和排出量，使得X射线系统可以容易地用于研究和商业应用。