发明授权
- 专利标题: Process for forming hafnia and zirconia based protective films on longitudinal magnetic recording media
- 专利标题(中): 在纵向磁记录介质上形成铪和氧化锆基保护膜的方法
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申请号: US567072申请日: 1990-08-14
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公开(公告)号: US5078846A公开(公告)日: 1992-01-07
- 发明人: Mark S. Miller , Roger L. Peterson
- 申请人: Mark S. Miller , Roger L. Peterson
- 申请人地址: CA Scotts Valley
- 专利权人: Seagate Technology, Inc.
- 当前专利权人: Seagate Technology, Inc.
- 当前专利权人地址: CA Scotts Valley
- 主分类号: C23C14/02
- IPC分类号: C23C14/02 ; C23C14/08 ; C23C14/16 ; C23C14/34 ; C23C14/58 ; G11B5/72 ; G11B5/84
摘要:
A process is disclosed for forming magnetic media, in which a protective overcoat of either partially stabilized zirconia or partially stabilized hafnia directly overlies a magnetic thin film recording layer. First, a chromium underlayer is sputter deposited onto a planar aluminum nickel phosphorous substrate. A crystalline magnetic recording layer is deposited onto the chromium underlayer, and substantially replicates the crystalline orientation of the underlayer. The substrate, underlayer and recording layer are passivated briefly in an oxygen atmosphere. Then, the hafnia or zirconia underlayer is applied by RF reactive sputtering in an atmosphere of argon and oxygen, with the argon partial pressure at least ten times the oxygen partial pressure. The passivation step improves the adhesion of the subsequently deposited cover layer, while the oxygen in the reactive sputtering process maintains a desired stoichiometric proportion of oxygen in the cover layer, for substantially improved media tribological properties.
公开/授权文献
- US4852805A Hybrid thrust reverser cascade basket and method 公开/授权日:1989-08-01
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