发明授权
- 专利标题: Process for preparing a monomolecular built-up film
- 专利标题(中): 制备单分子组合膜的方法
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申请号: US402183申请日: 1989-09-05
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公开(公告)号: US5093154A公开(公告)日: 1992-03-03
- 发明人: Motoyoshi Hatada , Kazufumi Ogawa , Hideharu Tamura
- 申请人: Motoyoshi Hatada , Kazufumi Ogawa , Hideharu Tamura
- 申请人地址: JPX both of JPX both of
- 专利权人: Matsushita Electric Industrial Co., Ltd.,Japan Atomic Energy Research Institute
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.,Japan Atomic Energy Research Institute
- 当前专利权人地址: JPX both of JPX both of
- 优先权: JPX63-221754 19880905
- 主分类号: B05D1/20
- IPC分类号: B05D1/20 ; B05D1/18 ; C08F30/08 ; C09D4/00
摘要:
A process for producing a monomolecular built-up film of monomolecular layers of a silane surfactant is described. In the process, the silane surfactant is chemically adsorbed on a hydrophilic surface of a substrate and is subjected to irradiation of a high energy beam or plasma treatment in an active gas atmosphere to activate the monomolecular layer. This activated layer is further adsorbed with the silane surfactant to form a built-up film. The beam irradiation or plasma treatment may be effected in a desired pattern. The beam irradiation or plasma treatment and the further adsorption are repeated until the desired number of the monomolecular layers is obtained.
公开/授权文献
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