发明授权
- 专利标题: Semiconductor pressure sensor and method of manufacturing same
- 专利标题(中): 半导体压力传感器及其制造方法
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申请号: US363526申请日: 1989-06-07
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公开(公告)号: US5095349A公开(公告)日: 1992-03-10
- 发明人: Tetsuo Fujii , Yoshitaka Gotoh , Susumu Kuroyanagi , Osamu Ina
- 申请人: Tetsuo Fujii , Yoshitaka Gotoh , Susumu Kuroyanagi , Osamu Ina
- 申请人地址: JPX Kariya
- 专利权人: Nippondenso Co., Ltd.
- 当前专利权人: Nippondenso Co., Ltd.
- 当前专利权人地址: JPX Kariya
- 优先权: JPX63-140676 19880608; JPX63-277119 19881101; JPX63-305061 19881201; JPX1-96872 19890417
- 主分类号: G01L9/00
- IPC分类号: G01L9/00 ; H01L27/20
摘要:
A semiconductor pressure sensor of this invention is intended to provide a semiconductor pressure sensor having an excellent electrical isolation between the supporting means of the semiconductor pressure sensor and the semiconductor substrate, the semiconductor pressure sensor basically comprising a semiconductor substrate having a first semiconductor region in which at least a semiconductor device is formed, a second semiconductor region and an isolated layer buried between the first and second semiconductor regions, a cavity provided in the second semiconductor region, the opening thereof existing on the main surface of the second semiconductor region and a strain detecting portion consisting of the semiconductor device and provided in the first semiconductor region opposite to the cavity. The semiconductor pressure sensor is featured in that at least one of the outer peripheral side surfaces of the first and the second semiconductor regions is formed inside of the outermost peripheral side surface of the isolation layer.
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