发明授权
- 专利标题: Robotically loaded epitaxial deposition apparatus
- 专利标题(中): 机械装载外延沉积装置
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申请号: US745818申请日: 1991-08-16
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公开(公告)号: US5104276A公开(公告)日: 1992-04-14
- 发明人: David W. Severns , Brian Tompson , Paul B. Lindstrom , David K. Carlson
- 申请人: David W. Severns , Brian Tompson , Paul B. Lindstrom , David K. Carlson
- 申请人地址: CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: CA Santa Clara
- 主分类号: H01L21/673
- IPC分类号: H01L21/673
摘要:
A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.
公开/授权文献
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