公开(公告)号：US5121531A

公开(公告)日：1992-06-16

申请号：US742569

申请日：1991-08-07

申请人： David W. Severns ,  Paul R. Lindstrom

发明人： David W. Severns ,  Paul R. Lindstrom

IPC分类号： C23C16/458 ,  C30B25/12 ,  H01L21/673 ,  H01L21/687

CPC分类号： H01L21/68728 ,  C23C16/4587 ,  C30B25/12 ,  H01L21/68771 ,  Y10T29/41

摘要： A hollow graphite susceptor for supporting semiconductor substrates during processing in epitaxial reactor systems. The susceptor has reduced wall thickness to provide lower thermal mass for rapid heating and high wafer throughput. Early failure of this thin-walled susceptor is avoided by providing a raised reinforcing boss on its interior surface in alignment with each recess on the exterior surface.

摘要翻译： 一种用于在外延反应器系统中处理期间支撑半导体衬底的中空石墨感受体。 基座具有减小壁厚以提供较低的热质量用于快速加热和高晶圆生产量。 通过在其内表面上提供与外表面上的每个凹部对准的凸起的加强凸台来避免该薄壁基座的早期故障。

公开(公告)号：US5116181A

公开(公告)日：1992-05-26

申请号：US354161

申请日：1989-05-19

申请人： David W. Severns ,  Brian Tompson ,  Paul R. Lindstrom ,  David K. Carlson

发明人： David W. Severns ,  Brian Tompson ,  Paul R. Lindstrom ,  David K. Carlson

IPC分类号： H01L21/205 ,  C23C16/54 ,  C30B25/02 ,  C30B35/00 ,  H01L21/673 ,  H01L21/687

CPC分类号： H01L21/68764 ,  C23C16/4401 ,  C23C16/54 ,  C30B25/02 ,  C30B35/005 ,  H01L21/68707 ,  H01L21/68771

摘要： A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.

公开(公告)号：US5476359A

公开(公告)日：1995-12-19

申请号：US968223

申请日：1992-10-29

申请人： David W. Severns ,  Brian Tompson ,  Paul R. Lindstrom ,  David K. Carlson

发明人： David W. Severns ,  Brian Tompson ,  Paul R. Lindstrom ,  David K. Carlson

IPC分类号： H01L21/205 ,  C23C16/54 ,  C30B25/02 ,  C30B35/00 ,  H01L21/673 ,  H01L21/687 ,  B65G47/00

CPC分类号： H01L21/68764 ,  C23C16/4401 ,  C23C16/54 ,  C30B25/02 ,  C30B35/005 ,  H01L21/68707 ,  H01L21/68771

摘要： A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.

公开(公告)号：US5104276A

公开(公告)日：1992-04-14

申请号：US745818

申请日：1991-08-16

申请人： David W. Severns ,  Brian Tompson ,  Paul B. Lindstrom ,  David K. Carlson

发明人： David W. Severns ,  Brian Tompson ,  Paul B. Lindstrom ,  David K. Carlson

IPC分类号： H01L21/673

CPC分类号： H01L21/68764 ,  H01L21/68771

摘要： A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.

摘要翻译： 携带用于处理的半导体晶片的感受体在其上端从柔性附件悬挂下来并进入用于处理的反应室。 在处理完成时，基座垂直取出以允许机器人卸载经处理的晶片并加载未处理的晶片。 为了在装载操作期间固定基座的位置，支撑托架被移动到位置以接合基座的下端。 有毒和腐蚀性的氯化物蒸汽通过连接到支撑架的真空管线同时从反应室中排出。

公开(公告)号：US5374159A

公开(公告)日：1994-12-20

申请号：US44919

申请日：1993-04-08

申请人： David W. Severns ,  Brian Tompson ,  Paul R. Lindstrom ,  David K. Carlson

发明人： David W. Severns ,  Brian Tompson ,  Paul R. Lindstrom ,  David K. Carlson

IPC分类号： H01L21/205 ,  C23C16/54 ,  C30B25/02 ,  C30B35/00 ,  H01L21/673 ,  H01L21/687 ,  C23C16/00

CPC分类号： H01L21/68764 ,  C23C16/4401 ,  C23C16/54 ,  C30B25/02 ,  C30B35/005 ,  H01L21/68707 ,  H01L21/68771

摘要： A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.

摘要翻译： 携带用于处理的半导体晶片的感受体在其上端从柔性附件悬挂下来并进入用于处理的反应室。 在处理完成时，基座垂直取出以允许机器人卸载经处理的晶片并加载未处理的晶片。 为了在装载操作期间固定基座的位置，支撑托架被移动到位置以接合基座的下端。 有毒和腐蚀性的氯化物蒸汽通过连接到支撑架的真空管线同时从反应室中排出。