发明授权
- 专利标题: Printing system exposure module alignment method and apparatus of manufacture
- 专利标题(中): 印刷系统曝光模块对准方法及制造装置
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申请号: US454657申请日: 1989-12-21
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公开(公告)号: US5105369A公开(公告)日: 1992-04-14
- 发明人: William E. Nelson
- 申请人: William E. Nelson
- 申请人地址: TX Dallas
- 专利权人: Texas Instruments Incorporated
- 当前专利权人: Texas Instruments Incorporated
- 当前专利权人地址: TX Dallas
- 主分类号: B41J2/44
- IPC分类号: B41J2/44 ; G03G15/04 ; G06K15/12
摘要:
There is disclosed a manufacturing method and apparatus which allows for the efficient assembly of the exposure module of a xerographic reproduction system. The system uses an array of deformable mirrors fabricated in one embodiment, on a monolithic silicon substrate as a light modulation element. The substrate package is positioned with respect to a set of molded support brackets such that a multi-axis adjustment of this single element allows for the alignment of the entire optical set. A system of cameras is used, in conjunction with a computer, to control the substrate positioning and to determine optimum efficiency of the system. The computer adjusts the package around the various rotational axis in sequential fashion.
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