发明授权
- 专利标题: Surface-treated polymethylsilsesquioxane powder
- 专利标题(中): 表面处理聚甲基倍半硅氧烷粉末
-
申请号: US444239申请日: 1989-12-01
-
公开(公告)号: US5106922A公开(公告)日: 1992-04-21
- 发明人: Kenji Saito , Hiroshi Kimura , Hideaki Muto
- 申请人: Kenji Saito , Hiroshi Kimura , Hideaki Muto
- 申请人地址: JPX Tokyo
- 专利权人: Toshiba Silicone Co., Ltd.
- 当前专利权人: Toshiba Silicone Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX63-303941 19881202
- 主分类号: C07F7/12
- IPC分类号: C07F7/12 ; C08J3/12
摘要:
A polymethylsilsesquioxane powder surface-treated with an organosilicone compound represented by the formula:(R.sup.1.sub.a R.sup.2.sub.3-a Si).sub.b Zwherein R.sup.1 represents an alkyl group substituted by a perfluoroalkyl group; R.sup.2 represents an unsubstituted monovalent hydrocarbon group; a is an integer of from 1 to 3; b is 1 or 2; and when b is 1, Z is selected from the group consisting of a hydrogen atom, a halogen atom, a hydroxyl group, --OR.sup.3, --NR.sup.3 X, --ON(R.sup.3).sub.2 and --OCOR.sup.3, and when b is 2, Z is selected from the group consisting of --O--, --N(X)-- and --S--, in which R.sup.3 represents an alkyl group having 1 to 4 carbon atoms and X is selected from the group consisting of a hydrogen atom and an alkyl group having 1 to 4 carbon atoms.
公开/授权文献
信息查询