发明授权
- 专利标题： Method for producing thin film of oxide superconductor
- 专利标题（中）： 生产氧化物超导体薄膜的方法
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申请号： US630241申请日： 1990-12-19
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公开(公告)号： US5108984A公开(公告)日： 1992-04-28
- 发明人: Jun Shioya , Yoichi Yamaguchi , Akira Mizoguchi , Noriyuki Yoshida , Kenichi Takahashi , Kenji Miyazaki , Satoshi Takano , Noriki Hayashi
- 申请人： Jun Shioya , Yoichi Yamaguchi , Akira Mizoguchi , Noriyuki Yoshida , Kenichi Takahashi , Kenji Miyazaki , Satoshi Takano , Noriki Hayashi
- 申请人地址： JPX Osaka
- 专利权人： Sumitomo Electric Industries, Ltd.
- 当前专利权人： Sumitomo Electric Industries, Ltd.
- 当前专利权人地址： JPX Osaka
- 优先权： JPX62-79354 19870330; JPX62-79355 19870330; JPX62-80426 19870331; JPX62-208925 19870821
- 主分类号： B32B18/00
- IPC分类号： B32B18/00 ; C04B35/45 ; C04B41/50 ; C04B41/52 ; C04B41/85 ; C04B41/89 ; H01L39/24
摘要：
A thin film of an oxide superconductor having a homogeneous composition and less oxygen defects is produced by independently vaporizing at least one material selected from the group consisting of the elements of Ia, IIa and IIIa groups of the periodic table and their compounds and at least one material selected from the group consisting of the elements of Ib, IIb and IIIb groups of the periodic table and their compounds in the presence of molecular oxygen and depositing the vaporized materials together with oxygen on a substrate to form a thin film of the oxide superconductor.
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