发明授权
US5114816A Radiation-sensitive compounds, radiation-sensitive mixture prepared
therewith and copying material
失效
辐射敏感性化合物,其制备的辐射敏感性混合物和复制材料
- 专利标题: Radiation-sensitive compounds, radiation-sensitive mixture prepared therewith and copying material
- 专利标题(中): 辐射敏感性化合物,其制备的辐射敏感性混合物和复制材料
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申请号: US431221申请日: 1989-11-03
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公开(公告)号: US5114816A公开(公告)日: 1992-05-19
- 发明人: Siegfried Scheler , Gerhard Buhr , Helmut Lenz , Klaus Bergmann , Herbert Siegel
- 申请人: Siegfried Scheler , Gerhard Buhr , Helmut Lenz , Klaus Bergmann , Herbert Siegel
- 申请人地址: DEX Frankfurt am Main
- 专利权人: Hoechst Aktiengesellschaft
- 当前专利权人: Hoechst Aktiengesellschaft
- 当前专利权人地址: DEX Frankfurt am Main
- 优先权: DEX3837500 19881104
- 主分类号: C07C309/26
- IPC分类号: C07C309/26 ; C07C309/52 ; C07C309/73 ; C07C311/37 ; C07C323/66 ; G03F7/022
摘要:
The invention relates to novel radiation-sensitive compounds which are esters or amides of a 1,2-naphthoquinone-(2)-diazide-4-sulfonic acid of the general formula ##STR1## in which R.sub.1 and R.sub.2 are identical or different and denote hydrogen, an alkyl group, an alkyl ether group or an alkyl thioether group whose carbon chains may be interrupted by ether oxygen atoms, an acylamino group, carboxylic acid ester group, sulfonic acid ester group or sulfonamide group,R.sub.1 and R.sub.2 not being hydrogen at the same time.The compounds are used as radiation-sensitive components in radiation-sensitive mixtures with which corresponding copying materials can be produced. The compounds have an absorption which is directed towards longer wavelengths matching the emission range of commercially available radiation sources. They also make it possible, in a reliable and practical manner, to carry out negativeworking image reversal processes.
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