发明授权
- 专利标题: Quantum well structure and semiconductor device using the same
- 专利标题(中): 量子阱结构和使用相同的半导体器件
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申请号: US706542申请日: 1991-05-22
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公开(公告)号: US5122844A公开(公告)日: 1992-06-16
- 发明人: Shigeyuki Akiba , Masashi Usami , Yuichi Matsushima , Kazuo Sakai , Katsuyuki Utaka
- 申请人: Shigeyuki Akiba , Masashi Usami , Yuichi Matsushima , Kazuo Sakai , Katsuyuki Utaka
- 申请人地址: JPX Tokyo
- 专利权人: Kokusai Denshin Denwa Kabushiki Kaisha
- 当前专利权人: Kokusai Denshin Denwa Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX63-185578 19880727
- 主分类号: H01L27/15
- IPC分类号: H01L27/15 ; H01L33/06 ; H01L33/14 ; H01L33/28 ; H01L33/30 ; H01S5/00 ; H01S5/34
摘要:
A quantum well structure is disclosed, which is comprised of a quantum well layer of a thickness substantially equal to the de Broglie wavelength of electrons and carrier confinement layers of an energy gap greater than that of the quantum well layer. A second material of a lattice constant different from that of a first material primarily for the quantum well layer is disposed in the quantum well layer to provide a phase shift in the period of the crystal lattice of the first material, thereby forming energy levels in the forbidden band of the quantum well layer. A semiconductor device which employs such a quantum well structure and is so constructed as to utilize its physical phenomenon which is caused by the energy levels in the forbidden band. In concrete terms, the present invention has its feature in allowing ease in the fabrication of an intermediate infrared or blue light emitting device, for instance.
公开/授权文献
- US5990850A Metallodielectric photonic crystal 公开/授权日:1999-11-23
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