发明授权
- 专利标题: Wafer processing film
- 专利标题(中): 加工薄膜
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申请号: US654962申请日: 1991-02-14
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公开(公告)号: US5126178A公开(公告)日: 1992-06-30
- 发明人: Yasuo Takemura , Osamu Narimatsu , Kazuyoshi Komatsu , Yoko Takeuchi
- 申请人: Yasuo Takemura , Osamu Narimatsu , Kazuyoshi Komatsu , Yoko Takeuchi
- 申请人地址: JPX Tokyo
- 专利权人: Misui Toatsu Chemicals
- 当前专利权人: Misui Toatsu Chemicals
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX2-031375 19900214
- 主分类号: C09J7/02
- IPC分类号: C09J7/02
摘要:
The present invention provides a water processing film fitted on one side of the base film with a pressure-sensitive adhesive layer and further with a release film on the surface of the pressure-sensitive adhesive layer, and coated on the back side of the base film a phosphoric surfactant wherein ionic components are not detected by ion chromatography, and can prevent failure of an integrated circuit dye static electricity generated in the handling of the wafer processing film and can also inhibit contamination and corrosion of the wafer by surfactant.
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