发明授权
US5127726A Method and apparatus for low angle, high resolution surface inspection
失效
用于低角度,高分辨率表面检查的方法和装置
- 专利标题: Method and apparatus for low angle, high resolution surface inspection
- 专利标题(中): 用于低角度,高分辨率表面检查的方法和装置
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申请号: US354486申请日: 1989-05-19
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公开(公告)号: US5127726A公开(公告)日: 1992-07-07
- 发明人: Kevin E. Moran
- 申请人: Kevin E. Moran
- 申请人地址: NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: NY Rochester
- 主分类号: G01B9/04
- IPC分类号: G01B9/04 ; G01B11/30 ; G01B21/30 ; G01N21/31 ; G01N21/88 ; G01N21/94 ; G01N21/95 ; G01N21/956 ; G06T1/00 ; H01L21/00 ; H01L21/66 ; H04N7/18
摘要:
The invention relates to an inspection system for inspecting the surfaces of wafers, LCD's and film substrates for flaws. The system includes a scanning laser inspection system for quickly inspecting the surface and identifying and locating the flaws. The system generates and displays a flaw map graphically illustrating the article surface and the respective locations of the flaws for subsequent optical inspection. The operator selects a flaw and an optical inspection system is positioned over the selected flaw to provide a magnified image of the flaw. The operator may optically inspect all or any number of the flaws. The invention also includes means for spectrometrically analyzing the reflected light to further identify the flaw.
公开/授权文献
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