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公开(公告)号:US20250035426A1
公开(公告)日:2025-01-30
申请号:US18891105
申请日:2024-09-20
Applicant: Tokyo Seimitsu Co., Ltd.
Inventor: Takashi OGURA , Xiaonan WANG
IPC: G01B9/0209 , G01B9/04 , G01B11/24
Abstract: A three-dimensional shape measuring device includes: an interference objective lens including an interfering unit configured to separate part of measurement light as reference light and generate multiplexed light of the measurement light returning from the surface to be measured and the reference light returning from a reference surface, and an objective lens configured to cause the measurement light to focus on the surface to be measured; a scanning unit configured to cause the interference objective lens to scan relatively with respect to the surface to be measured; an image capturing unit configured to repeatedly capture an image of the multiplexed light and output a plurality of captured images during scanning; and a first signal processing unit configured to calculate the three-dimensional shape of the surface to be measured, based on a result of comparing the sharpness of each pixel on the same coordinate of the plurality of captured images.
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2.
公开(公告)号:US10739687B2
公开(公告)日:2020-08-11
申请号:US16185062
申请日:2018-11-09
Applicant: ASML Netherlands B.V.
Inventor: Hendrik Jan Hidde Smilde , Bastiaan Onne Fagginger Auer , Davit Harutyunyan , Patrick Warnaar
Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.
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公开(公告)号:US20190265024A1
公开(公告)日:2019-08-29
申请号:US16410145
申请日:2019-05-13
Applicant: OLYMPUS CORPORATION
Inventor: Mayumi ODAIRA , Yoshimasa SUZUKI
Abstract: A sample shape measuring method includes a step of preparing illumination light passing through a predetermined illumination region, a step of applying the illumination light to a sample, and a predetermined processing step. The predetermined illumination region is set so as to include an optical axis at a pupil position of an illumination optical system. Light transmitted through the sample is incident on the observation optical system. The predetermined processing step includes a step of receiving light emerged from the observation optical system, a step of obtaining a quantity of light of the received light, a step of calculating a difference or a ratio between the quantity of light and a reference quantity of light, and a step of calculating an amount of tilt in a surface of the sample from the difference or the ratio.
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公开(公告)号:US10234268B2
公开(公告)日:2019-03-19
申请号:US15628272
申请日:2017-06-20
Applicant: National Taiwan Normal University
Inventor: Chau-Jern Cheng , Yu-Chih Lin , Han-Yen Tu
Abstract: A method for digital holographic microtomography comprises (a) providing at least one wavefront controlling device for driving a sample to be rotated and/or an incident beam scanning the sample, (b) utilizing a digital holographic access unit for recording the transmitted or reflected wavefronts of the sample, (c) utilizing a digital holography reconstructing method for reconstructing the transmitted or reflected wavefronts of the sample, and (d) utilizing a tomographic reconstruction approach for reconstructing three dimensional image information of the sample.
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公开(公告)号:US10168139B2
公开(公告)日:2019-01-01
申请号:US15182969
申请日:2016-06-15
Applicant: Interfiber Analysis, LLC
Inventor: Andrew D. Yablon
IPC: G01B9/04 , G01B9/02 , G01M11/00 , G01J3/28 , A61B5/00 , G01N21/47 , G01N33/483 , G01N21/41 , G01N21/45
Abstract: Briefly, embodiments of methods and/or systems for tomographic imaging are disclosed. In an example embodiment, optical measurements may be obtained for at least a portion of an illuminated object at a plurality of focal positions between the illuminated object and an imaging lens and at a plurality of angular orientations. Rotated representations of the optical measurements may be projected onto a coordinate plane in which in-focus and out-of-focus rotated representations of the optical measurements may form a cross-sectional image of the illuminated portion of the object.
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6.
公开(公告)号:US10162271B2
公开(公告)日:2018-12-25
申请号:US15115229
申请日:2014-12-30
Applicant: ASML Netherlands B.V.
Inventor: Hendrik Jan Hidde Smilde , Bastiaan Onne Fagginger Auer , Davit Harutyunyan , Patrick Warnaar
Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.
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公开(公告)号:US09816801B2
公开(公告)日:2017-11-14
申请号:US15072756
申请日:2016-03-17
Applicant: RAMOT AT TEL-AVIV UNIVERSITY LTD.
Inventor: Pinhas Girshovitz , Natan Tzvi Shaked
IPC: G01B9/02 , G01B9/04 , G02B21/00 , G02B21/14 , G03H1/26 , G01B11/06 , G02B5/12 , G02B17/08 , G02B27/10 , G02B27/28 , G03H1/04
CPC classification number: G01B9/0203 , G01B9/02011 , G01B9/02027 , G01B9/02028 , G01B9/02041 , G01B9/02047 , G01B9/02085 , G01B9/02097 , G01B9/04 , G01B11/06 , G02B5/12 , G02B17/08 , G02B21/0056 , G02B21/14 , G02B27/106 , G02B27/283 , G03H1/0443 , G03H1/265 , G03H2001/0445 , G03H2001/0456 , G03H2001/046
Abstract: The present invention provides a sample inspection and quantitative imaging system and method for performing off-axis interferometric imaging while enabling to record off-axis holograms in an extended field of view (FOV) than possible using a given camera and imaging setup, and thus to enlarge (e.g. double, triple, or even more than this) the interferometric FOV, without changing the imaging parameters, such as the magnification and the resolution.
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公开(公告)号:US09471984B2
公开(公告)日:2016-10-18
申请号:US14132086
申请日:2013-12-18
Applicant: Leica Microsystems (Schweiz) AG
Inventor: Reto Zuest , Meinrad Berchtel
CPC classification number: G06T7/0044 , G01B9/04 , G01B11/02 , G01B11/14 , G02B21/025 , G02B21/365 , G06T7/74
Abstract: A method for calibrating a microscope apparatus (1) having a variable optical magnification system (13) and a detector device (12) is disclosed. First, a calibrating mode is performed, wherein an image (50) of an object (10) is captured at a known reference magnification value, two characteristic reference points (32a, 32b) are determined in the image, a reference distance (34) between the two reference points is determined, and a correlation is determined between the reference distance and the reference magnification value. Later, a measuring mode is implemented, in which a current image (51) of the object (10) is captured at a second magnification value, the two characteristic reference points (52a, 52b) are identified therein, a current distance (54) between the current reference points is determined, and the second magnification value is determined from the current distance (54) based on the correlation between the reference distance (34) and the reference magnification value.
Abstract translation: 公开了一种用于校准具有可变光学放大系统(13)和检测器装置(12)的显微镜装置(1)的方法。 首先,执行校准模式,其中以已知的参考倍率值捕获对象(10)的图像(50),在图像中确定两个特征参考点(32a,32b),参考距离(34) 确定两个参考点之间,并且在参考距离和参考倍率值之间确定相关性。 之后,实现了以第二倍率值捕获对象(10)的当前图像(51)的两个特征参考点(52a,52b)的测量模式,当前距离(54) 确定当前参考点之间,并且基于参考距离(34)和参考倍率值之间的相关性,从当前距离(54)确定第二倍率值。
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公开(公告)号:US09410794B2
公开(公告)日:2016-08-09
申请号:US14499344
申请日:2014-09-29
Applicant: Carl Zeiss Microscopy GmbH
Inventor: Helmut Lippert , Nils Langholz
CPC classification number: G01B11/02 , G01B9/04 , G01B11/0608 , G01B11/24 , G01B2210/52
Abstract: Examination of a microscopic specimen is described. Height information for a respective plurality of lateral regions of the specimen is obtained from each of multiple specimen recordings, in which the height information of each specimen recording is limited to a respective height measurement range and the height measurement ranges of different specimen recordings are different. An overall image is calculated from the specimen recordings, in which overall image height information of the different specimen recordings is combined. Specimen recordings are recorded at such heights that: the height measurement ranges of different specimen recordings overlap each other, common lateral regions are identified in two respective specimen recordings for which lateral regions height information could be obtained in both specimen recordings, and a link of the height information of different specimen recordings is determined on the basis of the height information of different specimen recordings for at least one common lateral region.
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10.
公开(公告)号:US09366567B2
公开(公告)日:2016-06-14
申请号:US14288173
申请日:2014-05-27
Applicant: OLYMPUS CORPORATION
Inventor: Yosuke Tamura , Toshiya Komuro
CPC classification number: G01J1/42 , G01B9/04 , G01J1/4257 , G02B7/28 , G02B21/0092 , G02B21/247
Abstract: A focusing device that includes a differential interference prism used in differential interference observation in a focusing detection optical system includes: a light source that emits light with which a measurement surface of an observation sample is irradiated; a photo detection unit that detects light from the measurement surface; a focusing detection unit that detects an error signal near a focusing point of the measurement surface on the basis of an output signal from the photo detection unit; and a condition changing unit that changes an acquisition condition of the error signal.
Abstract translation: 在聚焦检测光学系统中包括用于差分干涉观察的差分干涉棱镜的聚焦装置包括:发射观察样品的测量表面的光的光源; 检测来自测量表面的光的光检测单元; 聚焦检测单元,其基于来自光检测单元的输出信号来检测测量表面的聚焦点附近的误差信号; 以及改变所述误差信号的获取条件的条件改变单元。
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