发明授权
- 专利标题： LPCVD reactor for high efficiency, high uniformity deposition
- 专利标题（中）： LPCVD反应器用于高效率，高均匀性沉积
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申请号： US784160申请日： 1991-10-28
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公开(公告)号： US5134963A公开(公告)日： 1992-08-04
- 发明人: Steven G. Barbee , Jonathan D. Chapple-Sokol , Richard A. Conti , David E. Kotecki
- 申请人： Steven G. Barbee , Jonathan D. Chapple-Sokol , Richard A. Conti , David E. Kotecki
- 申请人地址： NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： NY Armonk
- 主分类号： C23C16/52
- IPC分类号： C23C16/52 ; C23C16/44 ; C23C16/455 ; C30B25/14 ; H01L21/205
摘要：
An injector with a convex wall surface facing the susceptor directs vapor toward a wafer held by a susceptor producing a generally laminar flow across the surface of the wafer that in combination with the convex wall surface prevents formation of recirculation cells in the region between the wafer and the injector.
公开/授权文献
- US5676462A Suspended magnetic impeller/baffle apparatus for liquid 公开/授权日：1997-10-14