发明授权
- 专利标题: Silicon single crystal manufacturing apparatus
- 专利标题(中): 硅晶单晶制造设备
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申请号: US690920申请日: 1991-06-14
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公开(公告)号: US5139750A公开(公告)日: 1992-08-18
- 发明人: Yoshinobu Shima , Kenji Araki , Hiroshi Kamio , Makoto Suzuki
- 申请人: Yoshinobu Shima , Kenji Araki , Hiroshi Kamio , Makoto Suzuki
- 申请人地址: JPX Tokyo
- 专利权人: NKK Corporation
- 当前专利权人: NKK Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX1-268800 19891016
- 主分类号: C30B15/14
- IPC分类号: C30B15/14
摘要:
A silicon single crystal manufacturing apparatus which pulls a large-diameter silicon single crystal with improved yield and efficiency according to the rotary CZ method.As a means of preventing the solidification of molten silicon in the vicinity of a partition member, that is, one of factors which deteriorate the yield and efficiency, a heat shielding member having a predetermined position and shielding width is arranged to face a meniscus position of molten silicon thereby shielding the heat radiation from the meniscus portion.Its shape is a cylindrical shape, truncated-cone shape or a shape formed at its cylindrical bottom with a flange having a central opening.Its material primarily consists of a metal such as molybdenum or tantalum or an electric resistance heater.
公开/授权文献
- US4083231A Self-calibrating leak detector circuit arrangement 公开/授权日:1978-04-11
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