利索-全球专利检索

  1. Login
  2. Sign Up

Search Results

390 records (took 0.023 seconds)

    Charged Particle Ray Apparatus and Pattern Measurement Method
    2.
    发明申请
    Charged Particle Ray Apparatus and Pattern Measurement Method 有权
    带电粒子装置和图案测量方法

    公开(公告)号：US20140001360A1

    公开(公告)日：2014-01-02

    申请号：US14002275

    申请日：2012-01-27

    Applicant: Yuji Kasai ,  Makoto Suzuki ,  Hiroshi Makino

    Inventor： Yuji Kasai ,  Makoto Suzuki ,  Hiroshi Makino

    IPC: H01J37/05

    CPC classification number: H01J37/05 ,  G01N23/2251 ,  G06T1/00 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24475 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/24495

    Abstract: Provided is a technique to automatize a synthesis function of signal charged particles having different energies. A charged particle beam apparatus includes: a charged particle source configured to irradiate a sample with a primary charged particle ray; a first detector configured to detect a first signal electron having first energy from signal charged particles generated from the sample; a second detector configured to detect a second signal electron having second energy from signal charged particles generated from the sample; a first operation part configured to change a synthesis ratio of a signal intensity of the first signal electron and a signal intensity of the second signal electron and to generate a detected image corresponding to each synthesis ratio; a second operation part configured to calculate a ratio of signal intensities corresponding to predetermined two areas of the detected image generated for each synthesis ratio; and a third operation part configured to determine a mixture ratio to be used for acquisition of the detected image on a basis of a change of the ratio of signal intensities.

    Abstract translation: 提供了一种使具有不同能量的信号带电粒子的合成功能自动化的技术。 带电粒子束装置包括：带电粒子源，被配置为用一次带电粒子射线照射样品; 第一检测器，被配置为检测从所述样品产生的信号带电粒子的具有第一能量的第一信号电子; 第二检测器，被配置为检测从样品产生的信号带电粒子的具有第二能量的第二信号电子; 第一操作部，被配置为改变第一信号电子的信号强度和第二信号电子的信号强度的合成比，并且生成与每个合成比相对应的检测图像; 第二操作部，被配置为计算与针对每个合成比生成的检测图像的预定的两个区域相对应的信号强度的比率; 以及第三操作部件，被配置为基于信号强度比的变化来确定用于获取检测到的图像的混合比率。

    Voltage characteristic regulating method of latch circuit, voltage characteristic regulating method of semiconductor device, and voltage characteristic regulator of latch circuit
    3.
    发明授权
    Voltage characteristic regulating method of latch circuit, voltage characteristic regulating method of semiconductor device, and voltage characteristic regulator of latch circuit 失效
    锁存电路的电压特性调节方法，半导体器件的电压特性调节方法和锁存电路的电压特性调节器

    公开(公告)号：US08618870B2

    公开(公告)日：2013-12-31

    申请号：US13377009

    申请日：2010-06-11

    Applicant: Toshiro Hiramoto ,  Takayasu Sakurai ,  Makoto Suzuki

    Inventor： Toshiro Hiramoto ,  Takayasu Sakurai ,  Makoto Suzuki

    IPC: G05F1/10

    CPC classification number: G11C11/413

    Abstract: The voltage Vdd is set to be lower than in the normal operation (step S100), then voltage is applied to each of the power-supply voltage applied node Vdd, the ground voltage applied node Vss, the semiconductor substrate and the well so that relative high voltage between the gate of turn-on transistor and the semiconductor substrate or the gate of turn-on transistor and well (steps S110 and S120). This process accomplishes rising of the threshold voltage of the transistor that is turned on, the reduction of the variation in the threshold voltage between a plurality of the transistors of the memory cell including latch circuit, and the improvement of the voltage characteristic of the memory cell.

    Abstract translation: 电压Vdd被设定为低于正常工作（步骤S100），然后对电源电压施加节点Vdd，接地电压施加节点Vss，半导体衬底和阱施加电压，使得相对 导通晶体管的栅极与半导体衬底或导通晶体管的栅极之间的高电压（步骤S110和S120）。 该处理完成导通的晶体管的阈值电压的上升，包括锁存电路的存储单元的多个晶体管之间的阈值电压的变化的减小以及存储单元的电压特性的改善 。

    Charged particle beam apparatus and method for stably obtaining charged particle beam image
    4.
    发明授权
    Charged particle beam apparatus and method for stably obtaining charged particle beam image 失效
    带电粒子束装置和稳定获得带电粒子束图像的方法

    公开(公告)号：US08536540B2

    公开(公告)日：2013-09-17

    申请号：US13381953

    申请日：2010-05-14

    Applicant: Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

    Inventor： Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

    IPC: H01J37/26

    CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/20 ,  H01J2237/004 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Since charging characteristics differ between the outer circumferential portion and the center portion of a sample to be inspected, equivalent inspection sensitivities cannot be obtained in the outer circumferential portion and the center portion of the sample to be inspected. A sample cover is provided in the outer circumferential portion of a sample holder on which the sample to be inspected is placed. Charging characteristics of the sample cover are changed according to charging characteristics of the sample to be inspected. Consequently, uniform charged states can be formed in the outer circumferential portion and the center portion of the sample. Inspection/observation of the outer circumferential portion of the sample can be realized at higher sensitivity than in the past.

    Abstract translation: 由于待检查样品的外周部分和中心部分的充电特性不同，所以待检样品的外周部分和中心部分不能获得相同的检查灵敏度。 在待检测样品放置的样品架的外周部设置有样品盖。 样品盖的充电特性根据待检样品的充电特性而改变。 因此，可以在样品的外周部分和中心部分形成均匀的带电状态。 可以以比以往更高的灵敏度实现样品的外周部的检查/观察。

    OPTICAL INFORMATION RECORDING MEDIUM
    6.
    发明申请
    OPTICAL INFORMATION RECORDING MEDIUM 失效
    光信息记录介质

    公开(公告)号：US20120263029A1

    公开(公告)日：2012-10-18

    申请号：US13384069

    申请日：2010-07-15

    Applicant: Hideharu Tajima ,  Atsushi Etoh ,  Hiroaki Ashiwa ,  Makoto Suzuki ,  Ryo Kojima ,  Masahito Konishi ,  Isamu Kuribayashi

    Inventor： Hideharu Tajima ,  Atsushi Etoh ,  Hiroaki Ashiwa ,  Makoto Suzuki ,  Ryo Kojima ,  Masahito Konishi ,  Isamu Kuribayashi

    IPC: G11B3/70 ,  G11B7/26

    CPC classification number: G11B7/00736 ,  G11B7/0079 ,  G11B7/24038 ,  G11B7/24041 ,  G11B7/2433 ,  G11B7/254 ,  G11B7/2578 ,  G11B7/259

    Abstract: An optical information recording medium (1) includes on a substrate (50), a ROM layer (20), a RE layer (40), an intermediate layer (30) separating the ROM layer (20) and the RE layer (40), and a light transmitting layer (10) provided farthest from the substrate (50). The RE layer (40) is an information recording layer provided most farthest from the light transmitting layer (10), and is a recording layer of BCA recorded in a format easily determinable as compared to an information recording format used in the ROM layer (20), and antifouling property of a surface of the light transmitting layer (10) is set based on the RE layer (40). This makes it easy for the recording and reproducing apparatus to confirm a disc type, allows for sharing one recording and reproducing apparatus with other types of optical discs, and simplifies the disc production. Furthermore, an optical information recording medium is accomplished, in which outdated data on the ROM layer is replaced by recording, on the RE layer, updated data obtained while Internet connection can be established.

    Abstract translation: 光信息记录介质（1）包括在基板（50），ROM层（20），RE层（40），分离ROM层（20）和RE层（40）的中间层（30） ，以及距离基板（50）最远的透光层（10）。 RE层（40）是与光发射层（10）最距离设置的信息记录层，并且是以与在ROM层（20）中使用的信息记录格式相比容易确定的格式记录的BCA的记录层 ），并且基于RE层（40）设定透光层（10）的表面的防污性。 这使得记录和再现装置易于确认盘类型，允许与其他类型的光盘共享一个记录和再现装置，并且简化了盘的制作。 此外，在RE层上，通过记录来实现在ROM层上的过时数据被替换的光信息记录介质，可以建立互联网连接时获得的更新数据。

    CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR STABLY OBTAINING CHARGED PARTICLE BEAM IMAGE
    7.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR STABLY OBTAINING CHARGED PARTICLE BEAM IMAGE 失效
    充电颗粒光束装置和用于稳定获取的粒子束图像的方法

    公开(公告)号：US20120126118A1

    公开(公告)日：2012-05-24

    申请号：US13381953

    申请日：2010-05-14

    Applicant: Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

    Inventor： Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

    IPC: H01J37/26 ,  H01J37/20

    CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/20 ,  H01J2237/004 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Since charging characteristics differ between the outer circumferential portion and the center portion of a sample to be inspected, equivalent inspection sensitivities cannot be obtained in the outer circumferential portion and the center portion of the sample to be inspected. A sample cover is provided in the outer circumferential portion of a sample holder on which the sample to be inspected is placed. Charging characteristics of the sample cover are changed according to charging characteristics of the sample to be inspected. Consequently, uniform charged states can be formed in the outer circumferential portion and the center portion of the sample. Inspection/observation of the outer circumferential portion of the sample can be realized at higher sensitivity than in the past.

    Abstract translation: 由于待检查样品的外周部分和中心部分的充电特性不同，所以待检样品的外周部分和中心部分不能获得相同的检查灵敏度。 在待检测样品放置的样品架的外周部设置有样品盖。 样品盖的充电特性根据待检样品的充电特性而改变。 因此，可以在样品的外周部分和中心部分形成均匀的带电状态。 可以以比以往更高的灵敏度实现样品的外周部的检查/观察。

    PATTERN CHECK DEVICE AND PATTERN CHECK METHOD
    9.
    发明申请
    PATTERN CHECK DEVICE AND PATTERN CHECK METHOD 有权
    图案检查装置和图案检查方法

    公开(公告)号：US20110278452A1

    公开(公告)日：2011-11-17

    申请号：US13129201

    申请日：2009-10-15

    Applicant: Mari Nozoe ,  Hiroshi Miyai ,  Mitsuru Okamura ,  Makoto Suzuki ,  Yusuke Ominami

    Inventor： Mari Nozoe ,  Hiroshi Miyai ,  Mitsuru Okamura ,  Makoto Suzuki ,  Yusuke Ominami

    IPC: H01J37/26 ,  H01J37/285

    CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J2237/0048 ,  H01J2237/2008 ,  H01J2237/24564 ,  H01J2237/2817 ,  H01L22/12 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Provided is a pattern inspection apparatus including: a charge formation means which forms charge on a surface of a substrate (7) by generating an electron beam from a second electron source (20) which is different from an electron source (I) which generates an electron beam before irradiating an electron beam (3), a current measuring means (34) which measures a value of current flowing in the substrate while the charge is formed on the surface of the substrate by the charge formation means; and an adjustment means (37) which adjusts the charge formed by the charge formation means so that the value of the current measured by the current measuring means is a predetermined target value. Provided is also a pattern inspection method which uses the pattern inspection apparatus. Thus, it is possible to easily set an optimal condition of precharge executed before inspection of a pattern formed by a semiconductor apparatus manufacturing process and automatically inspection whether the precharge is good. Then, the inspection result is fed back to the operation afterward. This prevents lowering of the reliability of the inspection result and always enables a stable inspection.

    Abstract translation: 提供了一种图案检查装置，包括：电荷形成装置，其通过从不同于电子源（I）的第二电子源（20）产生电子束，在基板（7）的表面上形成电荷， 电子束（3）之前的电子束;电流测量装置（34），其通过电荷形成装置测量在基板的表面上形成电荷时在基板中流动的电流值; 以及调整装置，其调整由电荷形成装置形成的电荷，使得由电流测量装置测量的电流的值是预定的目标值。 还提供了使用图案检查装置的图案检查方法。 因此，可以容易地设定在由半导体装置制造工艺形成的图案的检查之前执行的预充电的最佳状态，并且自动检查预充电是否良好。 然后，检查结果反馈给操作。 这防止了检查结果的可靠性降低，并且始终能够进行稳定的检查。

Patent Agency Ranking