发明授权
- 专利标题： Resist composition and pattern formation process
- 专利标题（中）： 耐蚀组合物和图案形成过程
-
申请号： US667897申请日： 1991-03-12
-
公开(公告)号： US5153103A公开(公告)日： 1992-10-06
- 发明人: Akiko Kotachi , Satoshi Takechi
- 申请人： Akiko Kotachi , Satoshi Takechi
- 申请人地址： JPX Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX2-061552 19900313
- 主分类号： C08F20/02
- IPC分类号： C08F20/02 ; C08F20/22 ; C08F20/52 ; C08F30/08 ; C08F220/02 ; C08F220/22 ; C08F220/56 ; C08F220/58 ; C08F230/08 ; G03F7/004 ; G03F7/075 ; G03F7/26 ; H01L21/027 ; H01L21/30 ; H01L21/3213
摘要：
A high energy radiation-sensitive, pattern-forming resist composition comprising a polymer of the formula (I): ##STR1## in which R.sub.1 represents an alkyl groups, cyano group, --CH.sub.2 OH or --CH.sub.2 CO.sub.2 R wherein R represents an alkyl group, R.sub.2 represents a hydrocarbon group containing at least one silicon atom, R.sub.3 represents a group capable of causing crosslinking of the polymer upon application of heat, and m and n each is an integer. The resist composition is particularly useful as a top layer resist of the bi-level resist system, and the exposed top layer resist can be stably developed because of a remarkably increased difference of the solubility in the developer of the exposed and unexposed areas thereof.
公开/授权文献
- US5704037A Cursor positioning device for computer system 公开/授权日：1997-12-30
信息查询
IPC分类:
