发明授权
US5154873A Method and apparatus for mounting slice base on wafer of semiconductor
失效
用于安装半导体晶片上基片的方法和装置
- 专利标题: Method and apparatus for mounting slice base on wafer of semiconductor
- 专利标题(中): 用于安装半导体晶片上基片的方法和装置
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申请号: US590806申请日: 1990-10-01
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公开(公告)号: US5154873A公开(公告)日: 1992-10-13
- 发明人: Tsutomu Sato , Yasushi Yoshimura
- 申请人: Tsutomu Sato , Yasushi Yoshimura
- 申请人地址: JPX Niigata
- 专利权人: Naoetsu Electronics Company
- 当前专利权人: Naoetsu Electronics Company
- 当前专利权人地址: JPX Niigata
- 优先权: JPX1-322222 19891211
- 主分类号: H01L21/304
- IPC分类号: H01L21/304 ; B28D1/00 ; B28D5/00 ; H01L21/673 ; H01L21/687
摘要:
It is known that it is advantageous in semiconductor wafer production to re-slice a semiconductor wafer having impurity diffusion layers on both sides which are processed or doped in advance of the re-slicing process. In the re-slicing process, a thin slice base is mounted on the periphery of a semiconductor wafer prior to the re-slicing process for protecting the periphery of the wafer from chipping off damage during the re-slicing process by an ID saw or the like. The present invention provides several examples of methods and apparatus for mounting a slice base prepared in advance on the periphery of a semiconductor wafer by utilizing the method and apparatus of the present invention. In addition, another method and apparatus for simultaneously molding and mounting a molded type slice base by using a thermosetting type resin on the periphery of the semiconductor, whereby the re-slicing process of a semiconductor wafer is extremely improved in production and labor cost.
公开/授权文献
- US5691572A Interconnect structures for integrated circuits 公开/授权日:1997-11-25
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