发明授权
US5159173A Apparatus for reducing plasma constriction by intermediate injection of
hydrogen in RF plasma gun
失效
用于通过RF等离子体枪中的中间注入氢来减少等离子体收缩的装置
- 专利标题： Apparatus for reducing plasma constriction by intermediate injection of hydrogen in RF plasma gun
- 专利标题（中）： 用于通过RF等离子体枪中的中间注入氢来减少等离子体收缩的装置
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申请号： US774909申请日： 1991-10-11
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公开(公告)号： US5159173A公开(公告)日： 1992-10-27
- 发明人: Gerhard Frind , Sudhir D. Savkar
- 申请人： Gerhard Frind , Sudhir D. Savkar
- 申请人地址： NY Schenectady
- 专利权人： General Electric Company
- 当前专利权人： General Electric Company
- 当前专利权人地址： NY Schenectady
- 主分类号： H05H1/24
- IPC分类号： H05H1/24
摘要：
Apparatus and a method for generating an RF plasma plume wherein hydrogen gas is introduced downstream of the means for injecting plasma gas in order to increase the coupling between the RF coil and the plume and to decrease heat loss to the plasma containment walls.
公开/授权文献
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