发明授权
- 专利标题： Method for producing a superconducting circuit
- 专利标题（中）： 超导电路的制造方法
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申请号： US873351申请日： 1992-04-21
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公开(公告)号： US5169829A公开(公告)日： 1992-12-08
- 发明人: Nobuhiko Fujita , Hideo Itozaki , Saburo Tanaka , Naoji Fujimori , Takahiro Imai , Keizo Harada , Shuji Yazu , Tetsuji Jodai , Noriyuki Yoshida , Satoshi Takano , Kenji Miyazaki , Noriki Hayashi
- 申请人： Nobuhiko Fujita , Hideo Itozaki , Saburo Tanaka , Naoji Fujimori , Takahiro Imai , Keizo Harada , Shuji Yazu , Tetsuji Jodai , Noriyuki Yoshida , Satoshi Takano , Kenji Miyazaki , Noriki Hayashi
- 申请人地址： JPX Osaka
- 专利权人： Sumitomo Electric Industries, Ltd.
- 当前专利权人： Sumitomo Electric Industries, Ltd.
- 当前专利权人地址： JPX Osaka
- 优先权： JPX62-120817 19870518; JPX62-123449 19870520; JPX62-209930 19870824; JPX62-209931 19870824
- 主分类号： H01L39/24
- IPC分类号： H01L39/24
摘要：
An improvement in a process for manufacturing a superconductor, characterized by irradiating a material composed of compound oxide by one of ion beams selected from oxygen ion beam, inert gas ion beams and an ion beam consisting of a mixture of oxygen gas and inert gas to convert said material into a superconductor. When a focused ion beam is directed onto desired areas on said film layer, the areas irradiated by the ion beam are converted to a superconductor in a form of a superconducting circuit.
公开/授权文献
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