发明授权
US5206349A Aromatic diazo compounds and photosensitive compositions using the same
失效
芳香二氮唑化合物和使用它的感光组合物
- 专利标题: Aromatic diazo compounds and photosensitive compositions using the same
- 专利标题(中): 芳香二氮唑化合物和使用它的感光组合物
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申请号: US740636申请日: 1991-08-05
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公开(公告)号: US5206349A公开(公告)日: 1993-04-27
- 发明人: Hirotada Iida , Hajime Arai , Hitoshi Sugiura , Katsuhiko Sugou , Kieko Harada
- 申请人: Hirotada Iida , Hajime Arai , Hitoshi Sugiura , Katsuhiko Sugou , Kieko Harada
- 申请人地址: JPX Chiba
- 专利权人: Toyo Gosei Kogy Co., Ltd.
- 当前专利权人: Toyo Gosei Kogy Co., Ltd.
- 当前专利权人地址: JPX Chiba
- 优先权: JPX2-210253 19900810; JPX3-153295 19910625
- 主分类号: C07C245/20
- IPC分类号: C07C245/20 ; C07D233/36 ; C07D251/34 ; C07D403/14 ; G03F7/016
摘要:
An aromatic diazo compound having at least two groups of Formula (I) in the molecule.This aromatic diazo compound can be handled under visible light free from ultraviolet, is high in photosensitivity, and can be produced by a simple synthesis method.The diazo compound has a high solubility in organic solvents, appropriate for use as a photosensitive material for a lithographic printing plate, can be easily developed by an alkaline developing solution mainly based on an alkaline aqueous solution, and has a water solubility appropriate for use in a screen printing plate. ##STR1## wherein Z.sup.1 indicates ##STR2## wherein .phi..sup.1 is arylene or substituted arylene; and -.phi..sup.2 is >C.dbd.O, lower alkyl, lower alkylene, or aryl or substituted aryl.R.sup.1 and R.sup.2 are H, alkyl of C.sub.1 to C.sub.8, or alkyloxy of C.sub.1 to C.sub.8 ; X.sup.- is anion; and R.sup.3 indicates alkyl, saturated alkyl, aralkyl, substituted aralkyl, or a group similar to ##STR3##
公开/授权文献
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