发明授权
- 专利标题: Detection system for a radiation profile line
- 专利标题(中): 辐射剖面线检测系统
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申请号: US458703申请日: 1990-02-14
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公开(公告)号: US5210402A公开(公告)日: 1993-05-11
- 发明人: Gijsbert L. Oomen
- 申请人: Gijsbert L. Oomen
- 申请人地址: NLX Oldelft
- 专利权人: B.V. Optische Industies "De Oude Delft"
- 当前专利权人: B.V. Optische Industies "De Oude Delft"
- 当前专利权人地址: NLX Oldelft
- 优先权: NLX8701847 19870805
- 主分类号: G01B11/24
- IPC分类号: G01B11/24 ; G01B11/02 ; H04N5/30 ; H04N5/335 ; H04N7/18
摘要:
A radiation profile line originates from illuminating a scene by a fan beam of radiation and imaging the thus illuminated scene on a surface of an array of photosensitive elements. A read-out circuit has inputs connected to associated detection elements in the uppermost row. The read-out circuit comprises level detector circuitry to have the output signals of the columns take up either a "1" state or a "0" state. The outputs of the level detector curcuitry, each one of which corresponds to one of the inputs, are connected to a circuit that delivers a digital code representative of the position of the element in the uppermost row which has received the largest amount of light.
公开/授权文献
- US5731077A Self-lubricating device 公开/授权日:1998-03-24
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