发明授权
US5223719A Mask for use in a charged particle beam apparatus including beam passing
sections
失效
用于包括光束通过部分的带电粒子束装置的掩模
- 专利标题： Mask for use in a charged particle beam apparatus including beam passing sections
- 专利标题（中）： 用于包括光束通过部分的带电粒子束装置的掩模
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申请号： US724338申请日： 1991-07-05
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公开(公告)号： US5223719A公开(公告)日： 1993-06-29
- 发明人: Yasushi Takahashi , Kiichi Sakamoto , Yoshihisa Oae , Hiroshi Yasuda , Nobuyuki Yasutake
- 申请人： Yasushi Takahashi , Kiichi Sakamoto , Yoshihisa Oae , Hiroshi Yasuda , Nobuyuki Yasutake
- 申请人地址： JPX Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX2-178927 19900706; JPX2-181894 19900709; JPX2-217850 19900818
- 主分类号： H01J37/317
- IPC分类号： H01J37/317
摘要：
A charged particle beam mask and apparatus and method of using the same employing a mask that includes a substrate and a plurality of substantially rectangular beam passing sections arranged in parallel and to have a trapezoidal shape. In addition, the masks having a matrix of irradiation areas formed thereon where each irradiation area has a matrix of block patterns, are aligned and selectively irradiated to form a desired pattern on an object.
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