发明授权
- 专利标题： Lithography apparatus using scanning tunneling microscopy
- 专利标题（中）： 平版印刷设备使用扫描隧道显微镜
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申请号： US828349申请日： 1992-01-30
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公开(公告)号： US5227626A公开(公告)日： 1993-07-13
- 发明人: Takao Okada , Hiroshi Kajimura
- 申请人： Takao Okada , Hiroshi Kajimura
- 申请人地址： JPX Tokyo
- 专利权人： Olympus Optical Co., Ltd.
- 当前专利权人： Olympus Optical Co., Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX3-035090 19910206
- 主分类号： H01J37/28
- IPC分类号： H01J37/28 ; G01N37/00 ; G01Q20/02 ; G01Q60/10 ; G01Q80/00 ; G03F7/20 ; G03F9/00 ; G11B9/00 ; H01J37/30 ; H01J37/317 ; H01L21/00 ; H01L21/20 ; H01L21/205 ; H01L21/283 ; H01L21/30 ; H01L21/302 ; H01L21/3205 ; H01L21/68 ; H01L21/768
摘要：
A lithography apparatus is provided with an SXM base, which has a plurality of cantilevers movably supporting probes at their free ends, respectively. The SXM base is secured to a mirror base by a support arm via inchworm devices, such that it faces a silicon wafer placed on a wafer stage. The silicon wafer has an alignment pattern formed thereon, while the SXM base has a reference alignment pattern formed thereon which is similar to the alignment pattern. A voltage is applied to the probes at a predetermined point of time under the control of a controller while a gas containing a film-forming material is being supplied onto the wafer, whereby the film-forming material is adsorbed in a desired portion of the surface of the wafer.
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