发明授权
US5229234A Dual exposure method of forming a matrix for an electrophotographically
manufactured screen assembly of a cathode-ray tube
失效
形成用于阴极射线管的电子照相制造的屏幕组件的矩阵的双重曝光方法
- 专利标题: Dual exposure method of forming a matrix for an electrophotographically manufactured screen assembly of a cathode-ray tube
- 专利标题(中): 形成用于阴极射线管的电子照相制造的屏幕组件的矩阵的双重曝光方法
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申请号: US825889申请日: 1992-01-27
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公开(公告)号: US5229234A公开(公告)日: 1993-07-20
- 发明人: George H. N. Riddle , Louis S. Cosentino
- 申请人: George H. N. Riddle , Louis S. Cosentino
- 申请人地址: NJ Princeton
- 专利权人: RCA Thomson Licensing Corp.
- 当前专利权人: RCA Thomson Licensing Corp.
- 当前专利权人地址: NJ Princeton
- 主分类号: G03G9/09
- IPC分类号: G03G9/09 ; G03G13/22 ; H01J9/22 ; H01J9/227
摘要:
In an electrophotographic process for manufacturing a luminescent screen assembly on an interior surface of a faceplate panel of a CRT, the panel is first coated with a conductive layer and then overcoated with a photoconductive layer. A substantially uniform charge is established on the photoconductive layer. Selected areas of the photoconductive layer are exposed to actinic radiation, through a shadow mask, to affect the charge on the layer. The unexposed areas of the photoconductive layer are developed with triboelectrically-charged, dry-powdered, light-absorptive screen structure material. The photoconductive layer is reexposed to further discharge those open areas free of the light absorptive material while retaining the charge on those areas having light absorptive matrix material thereon. The reexposure increases the voltage contrast between the exposed and the unexposed areas of the photoconductive layer. A second development of the unexposed areas of the photoconductive layer deposits additional light-absorptive screen structure material on the previously deposited material to increase the opacity of the matrix formed thereby.
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