发明授权
- 专利标题: Photostable amorphous silicon-germanium alloys
- 专利标题(中): 光稳定型非晶硅 - 锗合金
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申请号: US802119申请日: 1991-12-03
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公开(公告)号: US5230753A公开(公告)日: 1993-07-27
- 发明人: Sigurd Wagner
- 申请人: Sigurd Wagner
- 申请人地址: NJ Princeton
- 专利权人: Princeton University
- 当前专利权人: Princeton University
- 当前专利权人地址: NJ Princeton
- 主分类号: H01L31/0376
- IPC分类号: H01L31/0376 ; H01L31/20
摘要:
Alloys of hydrogenated amorphous silicon and germanium are disclosed that exhibit unexpectedly low saturated defect densities, particularly relative to the initial defect densities of the alloys, so as to render them substantially resistant to Staebler-Wronski degradation. The alloys are producible using conventional equipment, but glow-discharge methods are preferred. The preferred amount of germanium in the alloy is about 15 at. % to about 50 at. %. The alloys are particularly useful for making photovoltaic cells. The alloys can be used as intrinsic semiconductors and doped for use as "n" or "p" materials. Methods for making the alloys are also disclosed.
公开/授权文献
- US5915750A Method of manufacturing stator and rotor cores 公开/授权日:1999-06-29
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