发明授权
US5237186A Conductivity-modulation metal oxide field effect transistor with single
gate structure
失效
具有单栅极结构的电导率调制金属氧化物场效应晶体管
- 专利标题: Conductivity-modulation metal oxide field effect transistor with single gate structure
- 专利标题(中): 具有单栅极结构的电导率调制金属氧化物场效应晶体管
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申请号: US823834申请日: 1992-01-21
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公开(公告)号: US5237186A公开(公告)日: 1993-08-17
- 发明人: Akio Nakagawa , Yoshihiro Yamaguchi , Kiminori Watanabe
- 申请人: Akio Nakagawa , Yoshihiro Yamaguchi , Kiminori Watanabe
- 申请人地址: JPX Kawasaki
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX62-41309 19870226; JPX62-110743 19870508; JPX62-304634 19871203; JPX63-199538 19880810; JPX1-18309 19890127; JPX1-187393 19890721
- 主分类号: H01L21/336
- IPC分类号: H01L21/336 ; H01L29/06 ; H01L29/08 ; H01L29/40 ; H01L29/739 ; H01L29/745
摘要:
There is disclosed a single-gate type conductivity-modulation field effect transistor having a semiconductive substrate, a base layer, and a source layer formed in the base layer. A source electrode is provided on a surface of the substrate, for electrically shorting the base layer with the source layer. A drain layer is provided in the substrate surface. A drain electrode is formed on the substrate surface to be in contact with the drain layer. A gate electrode is insulatively provided above the substrate surface, for covering a certain surface portion of the base layer which is positioned between the substrate and the source layer to define a channel region below the gate electrode. A lightly doped semiconductor diffusion layer is formed in the substrate surface so as to overlap said base layer and said drain layer. The diffusion layer having an impurity density which is varied continuously through the thickness of the diffusion layer.
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