发明授权
- 专利标题: Process gas supplying apparatus
- 专利标题(中): 工艺气体供应装置
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申请号: US773893申请日: 1991-12-02
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公开(公告)号: US5241987A公开(公告)日: 1993-09-07
- 发明人: Tadahiro Ohmi , Kazuhiko Sugiyama , Fumio Nakahara
- 申请人: Tadahiro Ohmi , Kazuhiko Sugiyama , Fumio Nakahara
- 申请人地址: JPX Miyagi
- 专利权人: Ohmi; Tadahiro
- 当前专利权人: Ohmi; Tadahiro
- 当前专利权人地址: JPX Miyagi
- 优先权: JPX1-107979 19890426
- 主分类号: B01F15/04
- IPC分类号: B01F15/04 ; B01F3/02 ; B01F3/04 ; C23C16/44 ; C23C16/448 ; C23F4/00 ; H01L21/205 ; H01L21/302 ; H01L21/3065
摘要:
When a process gas obtained by mixing a source gas with a diluting gas is supplied to a predetermined process apparatus, by supplying the process gas to the predetermined process apparatus through a gas contacting part connecting at least one source gas supplying pipe with at least one diluting gas supplying pipe, no chance that the source gas is exposed to air contamination is provided. Moreover, in particular, by forming the gas contacting part which is to be in contact with the above source gas, diluting gas and the like using such a material as metal, ceramic or the like, emission of materials having bad influences on the process gas, such as organic materials in particular, is eliminated. Furthermore, by providing a branching pipe or exhausting pipe, the degree of diluting the source gas can be varied stepwise, and by further combining with a flow rate adjuster, it can be varied continuously.
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