发明授权
- 专利标题： Total reflection X-ray fluorescence apparatus
- 专利标题（中）： 总反射X射线荧光装置
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申请号： US597027申请日： 1990-10-15
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公开(公告)号： US5249216A公开(公告)日： 1993-09-28
- 发明人: Tetsuya Ohsugi , Michihisa Kyoto , Kazuo Nishihagi
- 申请人： Tetsuya Ohsugi , Michihisa Kyoto , Kazuo Nishihagi
- 申请人地址： JPX Osaka JPX Osaka
- 专利权人： Sumitomo Electric Industries, Ltd.,Technos Co., Ltd.
- 当前专利权人： Sumitomo Electric Industries, Ltd.,Technos Co., Ltd.
- 当前专利权人地址： JPX Osaka JPX Osaka
- 优先权： JPX1-272123 19891019; JPX1-272124 19891019
- 主分类号： G01N23/22
- IPC分类号： G01N23/22 ; G01N23/203
摘要：
A total reflection X-ray fluorescence apparatus comprises a base material having an optically flat surface for totally reflecting X-rays radiated at a small glancing angle, a first detector such as an SSD for detecting fluorescent X-rays emerging from a specimen located near the optically flat surface of the base material and a second detector such as a scintillation counter for detecting an intensity of an X-rays coming from the base material.
公开/授权文献
- US5109396A Total reflection X-ray fluorescence apparatus 公开/授权日：1992-04-28
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