公开(公告)号：US5109396A

公开(公告)日：1992-04-28

申请号：US597027

申请日：1990-10-15

申请人： Tetsuya Ohsugi ,  Michihisa Kyoto ,  Kazuo Nishihagi

发明人： Tetsuya Ohsugi ,  Michihisa Kyoto ,  Kazuo Nishihagi

摘要： A total reflection X-ray fluorescence apparatus comprises a base material having an optically flat surface for totally reflecting X-rays radiated at a small glancing angle, a first detector such as an SSD for detecting fluorescent X-rays emerging from a specimen located near the optically flat surface of the base material and a second detector such as a scintillation counter for detecting an intensity of an X-rays coming from the base material.

公开(公告)号：US5220591A

公开(公告)日：1993-06-15

申请号：US813931

申请日：1991-12-27

申请人： Tetsuya Ohsugi ,  Michihisa Kyoto ,  Kazuo Nishihagi

发明人： Tetsuya Ohsugi ,  Michihisa Kyoto ,  Kazuo Nishihagi

IPC分类号： G01N23/22

CPC分类号： G01N23/2206

摘要： A total reflection X-ray fluorescence apparatus comprises a base material having an optically flat surface for totally reflecting X-rays radiated at a small glancing angle, a first detector such as an SSD for detecting fluorescent X-rays emerging from a specimen located near the optically flat surface of the base material and a second detector such as a scintillation counter for detecting intensity of X-rays coming from the base material.

摘要翻译： 全反射X射线荧光装置包括具有光学平面的基材，用于全反射以小的扫视角度辐射的X射线;第一检测器，例如用于检测从位于附近的样品出射的荧光X射线 基材的光学平坦表面和用于检测来自基材的X射线强度的闪烁计数器的第二检测器。

公开(公告)号：US5249216A

公开(公告)日：1993-09-28

申请号：US597027

申请日：1990-10-15

申请人： Tetsuya Ohsugi ,  Michihisa Kyoto ,  Kazuo Nishihagi

发明人： Tetsuya Ohsugi ,  Michihisa Kyoto ,  Kazuo Nishihagi

IPC分类号： G01N23/22 ,  G01N23/203

CPC分类号： G01N23/2206

摘要： A total reflection X-ray fluorescence apparatus comprises a base material having an optically flat surface for totally reflecting X-rays radiated at a small glancing angle, a first detector such as an SSD for detecting fluorescent X-rays emerging from a specimen located near the optically flat surface of the base material and a second detector such as a scintillation counter for detecting an intensity of an X-rays coming from the base material.

摘要翻译： 全反射X射线荧光装置包括具有光学平面的基材，用于全反射以小的扫视角度辐射的X射线;第一检测器，例如用于检测从位于附近的样品出射的荧光X射线 基材的光学平坦表面和用于检测来自基材的X射线强度的闪烁计数器的第二检测器。

公开(公告)号：US5568531A

公开(公告)日：1996-10-22

申请号：US428566

申请日：1995-04-25

申请人： Kazuo Nishihagi ,  Atsushi Kawabata

发明人： Kazuo Nishihagi ,  Atsushi Kawabata

IPC分类号： G01N23/205 ,  G01N23/20 ,  G01N23/70

CPC分类号： G01N23/20

摘要： A surface defect evaluating apparatus comprises an X-ray generator having a non-winding type cathode, a first slit device for shaping the X-ray flux from the X-ray generator, a diffraction crystal for obliquely receiving a slit-form X-ray flux passing through the slit device and diffracting the X-ray flux on a specific crystal plane, a second slit device for shaping the X-ray flux from the diffraction crystal, a photographic plate for detecting the intensity distribution of the flux diffracted on the specific crystal plane of a sample such as a semiconductor wafer after a slit-form X-ray flux passing through the second slit device obliquely irradiates the sample, a slit device, and a scintillator, installed at the back side of the photographic plate for detecting the intensity of the X-ray flux.

摘要翻译： 表面缺陷评估装置包括具有非绕组型阴极的X射线发生器，用于使来自X射线发生器的X射线通量成形的第一狭缝装置，用于倾斜地接收狭缝形X射线的衍射晶体 通过狭缝器件的磁通和衍射在特定晶面上的X射线通量，用于使来自衍射晶体的X射线通量成形的第二狭缝装置，用于检测衍射的光通量的特定的光束的强度分布的照相板 在通过第二狭缝装置的狭缝形式的X射线通量之后的样品（例如半导体晶片）的样品的倾斜照射样品，狭缝器件和闪烁体的样品的晶面安装在照相板的背面，用于检测 X射线通量的强度。