发明授权
- 专利标题: Reflux annealing device and method
- 专利标题(中): 回流退火装置及方法
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申请号: US544087申请日: 1990-06-26
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公开(公告)号: US5259900A公开(公告)日: 1993-11-09
- 发明人: John H. Tregilgas , Walter L. Kriss , Donald F. Weirauch
- 申请人: John H. Tregilgas , Walter L. Kriss , Donald F. Weirauch
- 申请人地址: TX Dallas
- 专利权人: Texas Instruments Incorporated
- 当前专利权人: Texas Instruments Incorporated
- 当前专利权人地址: TX Dallas
- 主分类号: C30B33/00
- IPC分类号: C30B33/00 ; C30B9/02
摘要:
Methods of annealing Hg.sub.1-x Cd.sub.x Te slices (56) in a mercury reflux chamber (32, 34) with a mercury reservoir (52) at the bottom and condensation regions at the top (62) is disclosed. The chamber is heated by a furnace (44) that creates an annealing region encompassing both the reservoir and a holder (46) for the Hg.sub.1-x Cd.sub.x Te slices (56). In preferred embodiment methods reservoir (52) is heated to 270.degree. C. for two hours to sixty days. An annealing immediately after LPE growth by use of either mercury vapor from the melt or a separate reservoir is also disclosed.
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