发明授权
- 专利标题： Sputtering apparatus with rotating target and target cooling
- 专利标题（中）： 具有旋转目标和目标冷却的溅射装置
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申请号： US918142申请日： 1992-07-23
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公开(公告)号： US5262032A公开(公告)日： 1993-11-16
- 发明人: Klaus Hartig , Anton Dietrich , Joachim Szczyrbowski
- 申请人： Klaus Hartig , Anton Dietrich , Joachim Szczyrbowski
- 申请人地址： DEX Hanau
- 专利权人： Leybold Aktiengesellschaft
- 当前专利权人： Leybold Aktiengesellschaft
- 当前专利权人地址： DEX Hanau
- 优先权： DEX4117368 19910528
- 主分类号： C23C14/34
- IPC分类号： C23C14/34 ; H01J37/34
摘要：
A sputtering apparatus is presented, especially one with a magnetron cathode and rotating target (1), and target cooling performed by a liquid coolant, preferably water, in which provision is made for the cooling to be concentrated on the area or areas of the rotating target (1) which are exposed to the heat produced by the plasma (12), and the magnets (28, 29, 30, 31) of the magnet assembly (23) form at least one cooling passage (34, 35).
公开/授权文献
- US4194362A Control system for a hydrostatic drive 公开/授权日：1980-03-25
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