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    Method for the production of coated glass with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation
    2.
    发明授权
    Method for the production of coated glass with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation 失效
    用于生产在可见光谱范围内具有高透射率并具有高反射率的热辐射的涂覆玻璃的方法

    公开(公告)号：US5201926A

    公开(公告)日：1993-04-13

    申请号：US230681

    申请日：1988-08-08

    申请人： Joachim Szczyrbowski ,  Anton Dietrich ,  Klaus Hartig

    发明人： Joachim Szczyrbowski ,  Anton Dietrich ,  Klaus Hartig

    IPC分类号： B60J1/00 ,  C03C17/36

    CPC分类号： C03C17/3618 ,  C03C17/36 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3681 ,  B60J1/002

    摘要： Method for making glazing with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation as well as low surface resistance. On substrates of mineral glass a system of coatings is built up in the following order:Coating 1: oxide from the group, tin oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or mixtures thereof,Coating 2: alloy of 80 weight-percent of nickel and 20 weight-percent of chromium,Coating 3: silver or a silver alloy with at least 50 weight-percent silver content,Coating 4: alloy of 80 weight-percent of nickel and 20 weight-percent of chromium,Coating 5: oxide from the group tin oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or mixtures thereof.Thereafter the substrate with the entire packet of coatings is heated to the softening temperature of the glass and bent to the final shape.

    摘要翻译： 在可见光谱范围内具有高透射率并具有高反射率的热辐射以及低表面电阻的方法。 在矿物玻璃的基材上，按照以下顺序建立涂层体系：涂层1：氧化锡，二氧化硅，氧化铝，氧化钽，氧化锆或其混合物，涂层1：氧化物，涂层2：合金80 镍的重量百分比和20重量％的铬，涂层3：银或银合金具有至少50重量％的银含量，涂层4：80重量％的镍和20重量％的铬的合金， 涂层5：氧化锡，二氧化硅，氧化铝，氧化钽，氧化锆或其混合物的氧化物。 此后，将具有整个涂层的基底加热至玻璃的软化温度并弯曲成最终形状。

    Process for the production of curve glazing with a high transmittance in the visible spectral range and a high reflectance for thermal radiation
    3.
    发明授权
    Process for the production of curve glazing with a high transmittance in the visible spectral range and a high reflectance for thermal radiation 失效
    用于生产在可见光谱范围内具有高透射率的曲线玻璃以及用于热辐射的高反射率的方法

    公开(公告)号：US4919778A

    公开(公告)日：1990-04-24

    申请号：US356668

    申请日：1989-05-19

    申请人： Anton Dietrich ,  Klaus Hartig ,  Joachim Szczyrbowski

    发明人： Anton Dietrich ,  Klaus Hartig ,  Joachim Szczyrbowski

    IPC分类号： C03C17/36 ,  C03C27/12

    CPC分类号： C03C17/3618 ,  C03C17/36 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3681 ,  C03C17/3689

    摘要： A system of layers is built up on substrates of mineral glass in the following order: first layer: an oxide from the group, stannic oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or their mixed oxides; second layer: a metal from the group, tantalum, tungsten, nickel, iron; third layer: silver or a silver alloy containing at least 50 weight-percent of silver; fourth layer: a metal from the group, tantalum, tungsten, nickel, iron or their alloys; fifth layer: an oxide from the group, stannic oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide or their mixed oxides. After that, the substrate with all the coating layers is heated to the softening temperature of the glass in an oxidizing atmosphere and bent to the final shape.

    摘要翻译： 按照以下顺序在矿物玻璃的基板上建立层的系统：第一层：来自该组的氧化物，氧化锡，二氧化硅，氧化铝，氧化钽，氧化锆或其混合氧化物; 第二层：一组金属，钽，钨，镍，铁; 第三层：含有至少50重量％银的银或银合金; 第四层：一组金属，钽，钨，镍，铁或它们的合金; 第五层：来自该组的氧化物，氧化锡，二氧化硅，氧化铝，氧化钽，氧化锆或它们的混合氧化物。 之后，将具有所有涂层的基板在氧化气氛中加热至玻璃的软化温度并弯曲成最终形状。

    Magnetron cathode for a rotating target
    4.
    发明授权
    Magnetron cathode for a rotating target 失效
    用于旋转靶的磁控管阴极

    公开(公告)号：US5364518A

    公开(公告)日：1994-11-15

    申请号：US976960

    申请日：1992-11-13

    申请人： Klaus Hartig ,  Anton Dietrich ,  Joachim Szczyrbowski

    发明人： Klaus Hartig ,  Anton Dietrich ,  Joachim Szczyrbowski

    IPC分类号： C23C14/34 ,  H01J37/34

    CPC分类号： H01J37/3455 ,  C23C14/3407 ,  H01J37/3405

    摘要： Magnets are arranged inside a rotating tubular target to form a racetrack-shaped plasma having two straight stretches parallel to the target axis and two end stretches connecting the straight stretches. In order to achieve uniform target erosion, the magnets are arranged so that the plasma is wider and therefore less intense over the end stretches than it is over the straight stretches.

    摘要翻译： 磁体布置在旋转的管状靶内，以形成具有平行于目标轴线的两个直线段和连接直线段的两个端部延伸部的跑道形等离子体。 为了实现均匀的目标侵蚀，磁体被布置成使得等离子体比在其直线延伸部分上更宽并且因此比端部延伸的强度更小。

    Process for coating substrates made of a transparent material, for example floatglass
    5.
    发明授权
    Process for coating substrates made of a transparent material, for example floatglass 失效
    用于涂覆由透明材料制成的基材的方法，例如浮法玻璃

    公开(公告)号：US4990234A

    公开(公告)日：1991-02-05

    申请号：US377531

    申请日：1989-07-10

    申请人： Joachim Szczyrbowski ,  Stephan Rogels ,  Anton Dietrich ,  Klaus Hartig

    发明人： Joachim Szczyrbowski ,  Stephan Rogels ,  Anton Dietrich ,  Klaus Hartig

    IPC分类号： C03C17/245 ,  C23C14/08

    CPC分类号： C23C14/08 ,  C03C17/245 ,  C03C2217/23 ,  C03C2218/155

    摘要： Process for coating transparent substrates, for example float glass, with a transparent dielectric layer having a low refractive index (n 6.0A cm.sup.2 /W sec) by means of reactive direct current cathode sputtering. A vacuum chamber includes a cathode 5 which is provided on one of its surfaces with the material (target) to be sputtered and deposited on the substrate 3. The material to be sputtered (target) is a silicide, preferably nickel disilicide (NiSi.sub.2), and the layer deposited on the substrate is the corresponding oxide, for example NiSi-oxide. The reactive gas introduced into the vacuum chamber is oxygen and the process gas is a noble gas.

    摘要翻译： 通过反应性直流阴极溅射，以高层生长速率（> 6.0A cm 2 / W sec）以透明的介电层涂覆透明基板（例如浮法玻璃），具有低折射率（n <1.7）的方法。 真空室包括阴极5，阴极5在其一个表面上提供要溅射并沉积在衬底3上的材料（靶）。待溅射的材料（靶）是硅化物，优选二硅化镍（NiSi 2）， 并且沉积在衬底上的层是相应的氧化物，例如NiSi氧化物。 引入真空室的反应气体是氧气，工艺气体是惰性气体。

    Sputtering apparatus with rotating target and target cooling
    6.
    发明授权
    Sputtering apparatus with rotating target and target cooling 失效
    具有旋转目标和目标冷却的溅射装置

    公开(公告)号：US5262032A

    公开(公告)日：1993-11-16

    申请号：US918142

    申请日：1992-07-23

    申请人： Klaus Hartig ,  Anton Dietrich ,  Joachim Szczyrbowski

    发明人： Klaus Hartig ,  Anton Dietrich ,  Joachim Szczyrbowski

    IPC分类号： C23C14/34 ,  H01J37/34

    CPC分类号： H01J37/3497 ,  C23C14/3407 ,  H01J37/3405

    摘要： A sputtering apparatus is presented, especially one with a magnetron cathode and rotating target (1), and target cooling performed by a liquid coolant, preferably water, in which provision is made for the cooling to be concentrated on the area or areas of the rotating target (1) which are exposed to the heat produced by the plasma (12), and the magnets (28, 29, 30, 31) of the magnet assembly (23) form at least one cooling passage (34, 35).

    摘要翻译： 提出了一种溅射装置，特别是具有磁控管阴极和旋转靶（1）的溅射装置，并且由液体冷却剂（优选水）进行目标冷却，其中提供用于使冷却集中在旋转的区域或区域上 暴露于由等离子体（12）产生的热的靶（1）和磁体组件（23）的磁体（28,29,30,31）形成至少一个冷却通道（34,35）。

    Method and equipment for coating substrates by means of a plasma discharge using a system of magnets to confine the plasma
    10.
    发明授权
    Method and equipment for coating substrates by means of a plasma discharge using a system of magnets to confine the plasma 失效
    通过使用磁体系统的等离子体放电来涂覆基板以限制等离子体的方法和设备

    公开(公告)号：US4863756A

    公开(公告)日：1989-09-05

    申请号：US15128

    申请日：1987-02-02

    申请人： Klaus Hartig ,  Anton Dietrich

    发明人： Klaus Hartig ,  Anton Dietrich

    IPC分类号： C23C14/12 ,  B05D3/14 ,  B05D7/24 ,  C23C16/503 ,  C23C16/54 ,  H01J37/32

    CPC分类号： B05D1/62 ,  C23C16/503 ,  C23C16/545 ,  H01J37/32366 ,  H01J37/32623 ,  H01J37/3266 ,  H01J37/32761 ,  B05D3/14

    摘要： Method for coating continuously moving substrates by the deposition of compounds from the gas phase by means of plasma discharge, produced by an electrode, with a chemical reaction, a system of magnets for the generation of a magnetic trap to constrict the plasma being disposed on one side of the substrate. The objective is to be accomplished by limiting the action of the plasma and the chemical reaction to the immediate vicinity of the system of magnets. For this purpose, the surface of the substrate to be coated is held at a distance "S.sub.1 " from the electrode, which is less than the dark-space distance that arises under the specified process conditions. Moreover, the magnetic trap is adjusted so that it passes through the substrate and is closed over the surface of the substrate to be coated and moreover in such a manner, that the constricted plasma is maintained on the surface of the substrate that is to be coated.

    摘要翻译： PCT No.PCT / EP86 / 00332 Sec。 371日期1987年2月2日 102（e）1987年2月2日PCT PCT。1986年6月4日PCT公布。 公开号WO86 / 07391 日期：1986年12月18日。通过借助等离子体放电由气相沉积化合物涂覆连续移动的基板的方法，由电极产生，具有化学反应，用于产生磁捕集器的磁体系统 压缩设置在基板的一侧上的等离子体。 目的是通过将等离子体和化学反应的作用限制在磁体系统附近来实现。 为此，待涂覆的基板的表面与电极保持距离“S1”，该距离小于在指定工艺条件下产生的暗空间距离。 此外，磁捕获器被调节使得其通过基底并且被封闭在待涂覆的基底的表面上，而且以这样的方式，缩小的等离子体保持在待涂覆的基底的表面上 。