发明授权
- 专利标题： Nanochannel glass matrix used in making mesoscopic structures
- 专利标题（中）： 用于制造介观结构的纳米通道玻璃基质
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申请号： US897638申请日： 1992-06-12
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公开(公告)号： US5264722A公开(公告)日： 1993-11-23
- 发明人: Ronald J. Tonucci , Brian L. Justus
- 申请人： Ronald J. Tonucci , Brian L. Justus
- 申请人地址： DC Washington
- 专利权人： The United States of America as Represented by the Secretary of the Navy
- 当前专利权人： The United States of America as Represented by the Secretary of the Navy
- 当前专利权人地址： DC Washington
- 主分类号： C03C14/00
- IPC分类号： C03C14/00 ; H01L27/00 ; H01L29/15 ; H01L27/12 ; C03C17/00 ; C03C27/00 ; H01L45/00
摘要：
The present invention provides a method of forming a semiconductor device mprising the steps of:forming a glass block of an acid inert glass having acid etchable glass rods extending therethrough, the acid etchable glass rods having an average diameter of less than 1 micron;partially etching one end of the acid etchable rods surface of the glass block to form cavities in the glass block on one surface thereof having an average diameter of less than 1 micron;depositing material(s) in the cavities to form a semiconductor device.The present invention also provides a method for forming a semiconductor device in which the acid etchable glass rods are completely etched and the deposition material(s) is deposited to fill the nanochannels formed by the etching.The present invention also provides semiconductor devices made by these methods.
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