Invention Grant
- Patent Title: Method of forming a self-aligned bipolar transistor
- Patent Title (中): 形成自对准双极晶体管的方法
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Application No.: US830783Application Date: 1992-02-03
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Publication No.: US5268314APublication Date: 1993-12-07
- Inventor: George W. Conner
- Applicant: George W. Conner
- Applicant Address: NY New York
- Assignee: Philips Electronics North America Corp.
- Current Assignee: Philips Electronics North America Corp.
- Current Assignee Address: NY New York
- Main IPC: H01L21/331
- IPC: H01L21/331 ; H01L21/762 ; H01L29/732
Abstract:
A bipolar transistor device having reduced collector-base capacitance and advantageous extrinsic base resistance properties is fabricated by a self-aligned process. Successively formed first and second self-aligned masking spacers are utilized to define the collector-base junction area and to permit the conductivity of base link and base contact portions of the extrinsic base to be independently established.
Public/Granted literature
- US4671765A Burner design for melting glass batch and the like Public/Granted day:1987-06-09
Information query
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