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US5268314A Method of forming a self-aligned bipolar transistor 失效
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Method of forming a self-aligned bipolar transistor
Abstract:
A bipolar transistor device having reduced collector-base capacitance and advantageous extrinsic base resistance properties is fabricated by a self-aligned process. Successively formed first and second self-aligned masking spacers are utilized to define the collector-base junction area and to permit the conductivity of base link and base contact portions of the extrinsic base to be independently established.
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