发明授权
US5270082A Organic vapor deposition process for corrosion protection of metal
substrates
失效
有机气相沉积工艺，用于金属基材的腐蚀保护
- 专利标题： Organic vapor deposition process for corrosion protection of metal substrates
- 专利标题（中）： 有机气相沉积工艺，用于金属基材的腐蚀保护
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申请号： US685747申请日： 1991-04-15
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公开(公告)号： US5270082A公开(公告)日： 1993-12-14
- 发明人: Tyau-Jeen Lin , Joseph A. Antonelli , Duck J. Yang , Hirotsugu Yasuda
- 申请人： Tyau-Jeen Lin , Joseph A. Antonelli , Duck J. Yang , Hirotsugu Yasuda
- 专利权人： Lin Tyau Jeen,Antonelli Joseph A,Yang Duck J,Hirotsugu Yasuda
- 当前专利权人： Lin Tyau Jeen,Antonelli Joseph A,Yang Duck J,Hirotsugu Yasuda
- 主分类号： C08G61/02
- IPC分类号： C08G61/02 ; C23C16/02 ; C23C16/30 ; C23C16/46
摘要：
A process of organic vapor deposition for significantly improved corrosion protection of metal. The process involves deposition of a thin film by polymerization of certain precursors onto the surface of a metal phosphate treated metal substrate (15). A primer or topcoat is subseqently applied over the metal substrate.