发明授权
- 专利标题: Metal-ceramic structure with intermediate high temperature reaction barrier layer
- 专利标题(中): 金属陶瓷结构具有中等高温反应势垒层
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申请号: US984613申请日: 1992-12-02
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公开(公告)号: US5290333A公开(公告)日: 1994-03-01
- 发明人: Herman F. Nied , Richard L. Mehan
- 申请人: Herman F. Nied , Richard L. Mehan
- 申请人地址: NY Schenectady
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: NY Schenectady
- 主分类号: B23K20/00
- IPC分类号: B23K20/00 ; C04B37/02 ; F28F21/04 ; F28F21/08 ; C03C27/00
摘要:
A Si--SiC ceramic layer is bonded to a non-porous SiC substrate with the Si etched from the layer to form a relatively porous surface on the otherwise non-porous high strength SiC substrate. A quartz layer is softened by heating and forced into the pores of the porous layer to form a mechanical bond to the SiC substrate. A refractory metal layer is bonded to the quartz layer to complete the joint. A refractory metal support component is then bonded to the refractory layer whereby the quartz serves as a high strength, high temperature reaction barrier between the metal of the refractory layer and the silicon of the SiC substrate.
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