发明授权
US5298111A Automatic wafer transfer apparatus and a method for transferring wafers
and an etching drum
失效
自动晶片转印装置和用于转印晶片和蚀刻滚筒的方法
- 专利标题: Automatic wafer transfer apparatus and a method for transferring wafers and an etching drum
- 专利标题(中): 自动晶片转印装置和用于转印晶片和蚀刻滚筒的方法
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申请号: US890192申请日: 1992-05-29
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公开(公告)号: US5298111A公开(公告)日: 1994-03-29
- 发明人: Fumihiko Hasegawa , Tatsuya Yamamoto , Shinji Sato
- 申请人: Fumihiko Hasegawa , Tatsuya Yamamoto , Shinji Sato
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Handotai Co., Ltd.
- 当前专利权人: Shin-Etsu Handotai Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX3-156089 19910531; JPX3-156092 19910531
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L21/677 ; H01L21/306 ; B44C1/22
摘要:
An automatic wafer transfer apparatus for transferring at once a plurality of wafers from a wafer basket to an etching drum which can be opened and closed by means of a movable housing and a horizontal set bar, to contain wafers therein; the wafer transfer apparatus comprising an elevator for elevating and lowering wafers, adapted to reciprocate vertically such that its top surface can pass through the etching drum to carry in the wafers, and the movable housing and the set bar of the etching drum for opening and closing the etching drum.
公开/授权文献
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