发明授权
US5305300A Magneto optical storage device using a multi-layer film of Pt/Co
laminated sections
失效
磁光存储器件采用Pt / Co层叠多层薄膜
- 专利标题: Magneto optical storage device using a multi-layer film of Pt/Co laminated sections
- 专利标题(中): 磁光存储器件采用Pt / Co层叠多层薄膜
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申请号: US888548申请日: 1992-05-22
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公开(公告)号: US5305300A公开(公告)日: 1994-04-19
- 发明人: Kenji Ohta , Akira Takahashi , Junsaku Nakajima , Yoshiteru Murakami
- 申请人: Kenji Ohta , Akira Takahashi , Junsaku Nakajima , Yoshiteru Murakami
- 申请人地址: JPX Osaka
- 专利权人: Sharp Kabushiki Kaisha
- 当前专利权人: Sharp Kabushiki Kaisha
- 当前专利权人地址: JPX Osaka
- 优先权: JPX3-20113 19910213; JPX3-118857 19910523; JPX3-118866 19910523
- 主分类号: G11B11/105
- IPC分类号: G11B11/105 ; G11B7/24
摘要:
A magneto-optical storage device having a configuration wherein a first AlN film, a Pt/co multi-layer film formed by alternately depositing Pt and Co, a second AlN film, and an Al reflective film are successively laminated on a substrate in this order. Assuming that respectively the thickness of the first AlN film is .delta.AlN (1); that of the second AlN film is .delta.AlN (2); that of the Pt single layer is .delta.Pt; that of the Co single layer is .delta.Co; and the total thickness of the Pt/Co multi-layer film is .delta.Pt/Co, each thickness of those layers is set to range within: 50 nm .ltoreq..delta.AlN (1).ltoreq.200 nm; 120 nm.ltoreq..delta.AlN (2).ltoreq.140 nm; 0.6 nm.ltoreq..delta.Pt.ltoreq.1.0 nm; 0.3 nm.ltoreq..delta.Co.ltoreq.0.6 nm; and 15 nm.ltoreq..delta.Pt/Co.ltoreq.20 nm. In accordance with the above arrangement, it is possible to greatly widen the tolerances of the film thicknesses of the first and second dielectric layers for obtaining a predetermined reflective index as well as a maximum Kerr rotation angle. Consequently, without strictly controlling the film thicknesses of the first and second AlN films, a magneto-optical storage device with stable performance suitable for practical use can be produced easily.
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