发明授权
- 专利标题： Gas supply system
- 专利标题（中）： 供气系统
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申请号： US942501申请日： 1992-09-09
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公开(公告)号： US5307568A公开(公告)日： 1994-05-03
- 发明人: Takenobu Matsuo , Tsuyoshi Wakabayashi , Shjui Moriya
- 申请人： Takenobu Matsuo , Tsuyoshi Wakabayashi , Shjui Moriya
- 申请人地址： JPX Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX3-258576 19910909; JPX3-258577 19910909; JPX3-258578 19910909; JPX3-259743 19910911
- 主分类号： C23C16/44
- IPC分类号： C23C16/44 ; H01J37/32 ; H01L21/00 ; F26B13/30
摘要：
A gas supply system includes a gas source containing a process gas to be supplied in a reduced-pressure container, a piping unit including a metallic pipe through which the process gas circulates and arranged between the gas supply source and the reduced-pressure container, and a duct formed of a metallic and/or nonmetallic pipe and arranged between the piping unit and the reduced-pressure container. At least part of the duct is formed of an austenitic stainless steel containing 6% or more of molybdenum by weight.
公开/授权文献
- US5798065A Collagen disruptive surface morphology for implants 公开/授权日：1998-08-25
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