发明授权
- 专利标题： Surface tension sulfuric acid composition
- 专利标题（中）： 低表面张力硫酸组成
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申请号： US602223申请日： 1990-11-15
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公开(公告)号： US5326490A公开(公告)日： 1994-07-05
- 发明人: Kiyoto Mori , Takao Shihoya , Hisao Hara, deceased
- 申请人： Kiyoto Mori , Takao Shihoya , Hisao Hara, deceased
- 申请人地址： JPX Tokyo JPX Tokyo
- 专利权人： Kanto Kagaku Kabushiki Kaisha,Nissan Chemical Industries, Ltd.
- 当前专利权人： Kanto Kagaku Kabushiki Kaisha,Nissan Chemical Industries, Ltd.
- 当前专利权人地址： JPX Tokyo JPX Tokyo
- 优先权： JPX1-60765 19890315
- 主分类号： C09K13/08
- IPC分类号： C09K13/08 ; C09D9/00 ; C11D1/00 ; C23F1/16 ; C23G1/02 ; H01L21/304 ; H01L21/306 ; C09K13/04 ; H01L21/00 ; H01L21/02
摘要：
Sulfuric acid or sulfuric acid/hydrogen peroxide cleaning solutions used in semiconductor manufacturing processes are improved in wettability and cleaning effect by lowering their surface tension through the addition of surface-active agents Of the general formula R.sup.1 SO.sub.2 NR.sup.2 C.sub.2 H.sub.4 OA(I) wherein R.sup.1 stands for a fluoroalkyl group, R.sup.2 for H or a lower alkyl group and A for H or SO.sub.3 H.
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