发明授权
US5331468A Intensity redistribution for exposure correction in an overfilled
symmetrical laser printer
失效
在过度填充的对称激光打印机中进行曝光校正的强度再分配
- 专利标题: Intensity redistribution for exposure correction in an overfilled symmetrical laser printer
- 专利标题(中): 在过度填充的对称激光打印机中进行曝光校正的强度再分配
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申请号: US982322申请日: 1992-11-27
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公开(公告)号: US5331468A公开(公告)日: 1994-07-19
- 发明人: Mark L. Noethen
- 申请人: Mark L. Noethen
- 申请人地址: NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: NY Rochester
- 主分类号: G02B26/10
- IPC分类号: G02B26/10 ; B41J2/47 ; G02B5/20 ; G02B26/12 ; G02B27/09 ; H04N1/113 ; G02B9/00 ; G02B26/08
摘要:
A method for redistributing intensity of a Gaussian beam of light having a Gaussian shaped intensity profile comprises the steps of exposing a photosensitive material to a scanning beam of a laser printing apparatus, writing a desired pattern onto the photosensitive material with the laser printing apparatus, and interposing the exposed photosensitive material in the Gaussian beam and flattening the Gaussian shaped intensity profile of the Gaussian beam. A beam shaper has a laser source for producing a beam of light, a collimating lens for receiving the beam of light from the laser source and producing a collimated beam of light, an apodizer for receiving the collimated beam of light and flattening a Gaussian intensity of the collimated beam in one dimension only, and shaping optics for receiving the beam from the apodizer and producing a beam that is large in a line scan direction.
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